Mr. Fu-Jye Liang Profile

Fu-Jye Liang

at Taiwan Semiconductor Manufacturing Co Ltd

SPIE Involvement:

Author

Publications (9)

Proceedings Article | 27 March 2007 Paper

Immersion defect reduction, part I: analysis of water leaks in an immersion scanner

Fu-Jye Liang, Hsing Chang, Lin-Hung Shiu, Chun-Kuang Chen, Li-Jui Chen, Tsai-Sheng Gau, Burn J. Lin

Proceedings Volume 6520, 65204U (2007) https://doi.org/10.1117/12.712531

KEYWORDS: Semiconducting wafers, Scanners, Digital watermarking, Particles, Superposition, Microfluidics, Printing, Computer simulations, System identification, Immersion lithography

Read Abstract +

Proceedings Article | 26 March 2007 Paper

Immersion defect reduction, part II: the formation mechanism and reduction of patterned defects

Lin-Hung Shiu, Fu-Jye Liang, Hsing Chang, Chun-Kuang Chen, Li-Jui Chen, Tsai-Sheng Gau, Burn Lin

Proceedings Volume 6520, 652012 (2007) https://doi.org/10.1117/12.712527

KEYWORDS: Particles, Semiconducting wafers, Scanning electron microscopy, Digital watermarking, Printing, Defect inspection, Polymers, Immersion lithography, Neodymium, Wafer-level optics

Read Abstract +

SPIE Journal Paper | 1 January 2007 Open Access

Defect reduction with special routing for immersion lithography

Fu-Jye Liang, Lin-Hung Shiu, Chun-Kuang Chen, Li-Jui Chen, Tsai-Sheng Gau, Burn Lin

JM3, Vol. 6, Issue 01, 010501, (January 2007) https://doi.org/10.1117/12.10.1117/1.2718941

KEYWORDS: Semiconducting wafers, Particles, Immersion lithography, Printing, Scanners, Double patterning technology, Liquids, Digital watermarking, Wafer testing, Reticles

Read Abstract +

DOWNLOAD PAPER

Proceedings Article | 6 December 2004 Paper

Phase-defocus windows for alternating phase shifting mask

Fu-Jye Liang, Chun-Kuang Chen, Jaw-Jung Shin, Jan-Wen You, Chun-Heng Lin, Zhin-Yu Pan, King-Chang Shu, Tsai-Sheng Gau, Burn Lin

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569216

KEYWORDS: Photomasks, Semiconducting wafers, Phase shifting, Phase shifts, Photomask technology, Optical lithography, Quartz, Etching, Mask making

Read Abstract +

SPIE Journal Paper | 1 October 2002

Customized illumination aperture filter design for through-pitch focus latitude enhancement of deep submicron contact hole printing

Shuo-Yen Chou, Jen-Chung Lou, Fu-Jye Liang, Tsai-Sheng Gau, Ru-Gun Liu, Chun-Kuang Chen, Chih-Ming Lai

JM3, Vol. 1, Issue 03, (October 2002) https://doi.org/10.1117/12.10.1117/1.1502261

KEYWORDS: Diffraction, Printing, Photomasks, Phase shifts, Lithographic illumination, Visualization, Monochromatic aberrations, Lithography, Optical lithography, Resolution enhancement technologies

Read Abstract +

Proceedings Article | 14 September 2001 Paper

Optimal positions for SB assignment and the specification of SB width variation

Chih-Ming Lai, Ru-Gun Liu, Tsai-Sheng Gau, Fu-Jye Liang, Shuo-Yen Chou, Lin-Hung Shiu

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435683

KEYWORDS: Antimony, Scattering, Critical dimension metrology, Double sideband modulation, Resolution enhancement technologies, Modulation, Superposition, Light scattering, Chromium, Photoresist processing

Read Abstract +

Proceedings Article | 14 September 2001 Paper

Evaluating the impact of spherical aberration on sub-0.2-um contact/via hole patterning

Shuo-Yen Chou, Jen-Chung Lou, Chih-Ming Lai, Fu-Jye Liang, Li-Jui Chen

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435668

KEYWORDS: Monochromatic aberrations, Photomasks, Lithography, Phase shifts, Lithographic illumination, Optical lithography, Critical dimension metrology, Electroluminescence, Printing, Diffraction

Read Abstract +

Proceedings Article | 24 August 2001 Paper

Novel negative photoresist process for 0.18 um dual damascene

Lin-Hung Shiu, Chih-Ming Lai, Fu-Jye Liang, Hung-Chun Chen, Li-Jui Chen, Shuo-Yen Chou

Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436891

KEYWORDS: Photoresist processing, Scanning electron microscopy, Etching, Copper, Resolution enhancement technologies, Bottom antireflective coatings, Photomasks, Photoresist materials, Phase shifts, Aluminum

Read Abstract +

Proceedings Article | 5 July 2000 Paper

Customized illumination aperture filter for low k1 photolithography process

Tsai-Sheng Gau, Ru-Gun Liu, Chun-Kuang Chen, Chih-Ming Lai, Fu-Jye Liang, Chin Hsia

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389016

KEYWORDS: Optical proximity correction, Diffraction, Printing, Optical lithography, Electroluminescence, Lithographic illumination, Resolution enhancement technologies, Photomasks, Scanning electron microscopy, Diffractive optical elements

Read Abstract +

Showing 5 of 9 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years