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Fumihiko Nakamura
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Publications (3)
Proceedings Article | 16 March 2007 Paper
Recent progress of a character projection-type low-energy electron-beam direct writing system
Kouhei Noguchi, Katsuhide Watanabe, Hidetoshi Kinoshita, Hiroyuki Shinozaki, Yasushi Kojima, Satoshi Morita, Fumihiko Nakamura, Norihiro Yamaguchi, Kazuhiko Kushitani, Tetsuro Nakasugi, Takeshi Koshiba, Takumi Oota
Proceedings Volume 6517, 65172I (2007) https://doi.org/10.1117/12.712118
KEYWORDS: Amplifiers, Semiconducting wafers, Data conversion, Distortion, Electron beam direct write lithography, Optical alignment, Control systems, Electrons, Data processing, Process control
Proceedings Article | 15 March 2007 Paper
Alignment method of low-energy electron-beam direct writing system EBIS using voltage contrast image
Proceedings Volume 6517, 651713 (2007) https://doi.org/10.1117/12.711368
KEYWORDS: Virtual colonoscopy, Optical alignment, Signal detection, Silicon, Metals, Image analysis, Overlay metrology, Lithography, Distortion, Back end of line
Proceedings Article | 24 March 2006 Paper
A character projection low energy electron beam direct writing system for device of small production lot with a variety of design
Fumihiko Nakamura, Katsuhide Watanabe, Hidetoshi Kinoshita, Hiroyuki Shinozaki, Yasushi Kojima, Satoshi Morita, Kouhei Noguchi, Norihiro Yamaguchi, Hisashi Isokawa, Kazuhiko Kushitani, Takayuki Satoh, Takeshi Koshiba, Takumi Oota, Tetsuro Nakasugi, Hiroyuki Mizuno
Proceedings Volume 6151, 61512A (2006) https://doi.org/10.1117/12.655963
KEYWORDS: Semiconducting wafers, Electron beam direct write lithography, Control systems, Electron beams, Vestigial sideband modulation, Data conversion, Beam shaping, Photomasks, Optical alignment, Amplifiers
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