Fumihiro Koba
Researcher at SELETE
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 2 April 2007 Paper
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Electron beam lithography, Refractive index, FT-IR spectroscopy, Optical properties, Etching, Polymers, Silicon, Scanning electron microscopy, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 24 March 2006 Paper
Proc. SPIE. 6151, Emerging Lithographic Technologies X
KEYWORDS: Lithography, Electron beam lithography, Etching, Photomasks, Extreme ultraviolet lithography, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Failure analysis, Back end of line

Proceedings Article | 23 March 2006 Paper
Proc. SPIE. 6151, Emerging Lithographic Technologies X
KEYWORDS: Electron beam lithography, Optical lithography, Scattering, Etching, Silicon, Image resolution, Photomasks, Mask making, Reactive ion etching, Semiconducting wafers

Proceedings Article | 6 May 2005 Paper
Proc. SPIE. 5751, Emerging Lithographic Technologies IX
KEYWORDS: Lithography, Electron beam lithography, Metals, Scanners, Copper, Resistance, Scanning electron microscopy, Transmission electron microscopy, Overlay metrology, Chemical mechanical planarization

Proceedings Article | 20 May 2004 Paper
Proc. SPIE. 5374, Emerging Lithographic Technologies VIII
KEYWORDS: Lithography, Electron beam lithography, Reticles, Distortion, Photomasks, Optical alignment, Semiconducting wafers, Data corrections, Projection lithography, Overlay metrology

Showing 5 of 8 publications
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