Fumiko Iwao
at Tokyo Electron AT Ltd
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 20 March 2015 Paper
Proc. SPIE. 9425, Advances in Patterning Materials and Processes XXXII
KEYWORDS: Optical lithography, Polymethylmethacrylate, Etching, Image processing, Manufacturing, Ecosystems, Line width roughness, Directed self assembly, Line edge roughness, Semiconducting wafers

Proceedings Article | 20 March 2012 Paper
Proc. SPIE. 8325, Advances in Resist Materials and Processing Technology XXIX
KEYWORDS: Carbon, Silica, Etching, Particles, Scanning electron microscopy, Photomasks, Extreme ultraviolet lithography, Line edge roughness, Photoresist processing, System on a chip

Proceedings Article | 8 April 2011 Paper
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Thin films, Contamination, Data modeling, Calibration, Etching, Coating, Scanning electron microscopy, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

Proceedings Article | 30 March 2010 Paper
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Etching, Image processing, Particles, Diffusion, Line width roughness, Double patterning technology, Critical dimension metrology, Thin film coatings, Photoresist processing, Semiconducting wafers

Proceedings Article | 11 December 2009 Paper
Proc. SPIE. 7520, Lithography Asia 2009
KEYWORDS: Lithography, Optical lithography, Silica, Etching, Photoresist materials, Atomic layer deposition, Line width roughness, Double patterning technology, Photoresist processing, Resolution enhancement technologies

Showing 5 of 9 publications
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