Proceedings Article | 1 August 2002
KEYWORDS: Coating, Reticles, Photoresist processing, Scanning electron microscopy, Critical dimension metrology, Compact discs, Opacity, Photomasks, Image resolution, Standards development
A negative-CAR for EB reticle fabrication beyond 100 nm node is needed, which is superior in performance such as resolution, sensitivity, pattern quality, CD movement by process delays (PCD, PED) and process latitudes. We started preliminary screening on negative-CARs, and more than 10 resists out of 3 suppliers were examined including some that were still under development. Then, three CARs (A-2, B-1 and C-3) was selected as candidates, and those candidates were evaluated in 'resolution and sensitivity', 'pattern quality', 'CD movement due to process delays' and 'process latitudes'. B-1 turned out to be the best choice in total performance. In addition, thinning coating thickness was investigated for resolution improvement. A negative-CAR for EB reticle fabrication beyond 100 nm node is needed, which is superior in performance such as resolution, sensitivity, pattern quality, CD movement by process delays (PCD, PED) and process latitudes. We started preliminary screening on negative-CARs, and more than 10 resists out of 3 suppliers were examined including some that were still under development. Then, three CARs (A-2, B-1 and C-3) was selected as candidates, and those candidates were evaluated in 'resolution and sensitivity', 'pattern quality', 'CD movement due to process delays' and 'process latitudes'. B-1 turned out to be the best choice in total performance. In addition, thinning coating thickness was investigated for resolution improvement.
