Mr. Fumio Aramaki Profile

Fumio Aramaki

at Hitachi High-Tech Corp

SPIE Involvement:

Author

Area of Expertise:

Focused Ion Beam (FIB) , Gas Field Ion Source (GFIS) , Photomask Repair

Publications (11)

Proceedings Article | 21 October 2014 Paper

Performance of GFIS mask repair system for various mask materials

Fumio Aramaki, Tomokazu Kozakai, Osamu Matsuda, Anto Yasaka, Shingo Yoshikawa, Koichi Kanno, Hiroyuki Miyashita, Naoya Hayashi

Proceedings Volume 9235, 92350F (2014) https://doi.org/10.1117/12.2069435

KEYWORDS: Photomasks, Etching, Scanning electron microscopy, Ions, Quartz, Semiconducting wafers, Critical dimension metrology, Phase shifts, Nitrogen

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Proceedings Article | 2 July 2013 Paper

Repair Technology for Large Scale Photomasks

Fumio Aramaki

Proceedings Volume 8441, 84410O (2013) https://doi.org/10.1117/12.1000135

KEYWORDS: Tantalum, Barium, Optical testing, Ions, Sensors, Laser applications, Raster graphics, Image processing, Etching, Photomasks

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Proceedings Article | 30 June 2012 Paper

Photomask repair technology by using gas field ion source

Fumio Aramaki, Tomokazu Kozakai, Osamu Matsuda, Osamu Takaoka, Yasuhiko Sugiyama, Hiroshi Oba, Kazuo Aita, Anto Yasaka

Proceedings Volume 8441, 84410D (2012) https://doi.org/10.1117/12.981167

KEYWORDS: Etching, Critical dimension metrology, Photomasks, Ions, Quartz, Image resolution, Atomic force microscopy, Extreme ultraviolet, Ion beams, Scanning electron microscopy

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Proceedings Article | 7 April 2011 Paper

Development of new FIB technology for EUVL mask repair

Fumio Aramaki, Takashi Ogawa, Osamu Matsuda, Tomokazu Kozakai, Yasuhiko Sugiyama, Hiroshi Oba, Anto Yasaka, Tsuyoshi Amano, Hiroyuki Shigemura, Osamu Suga

Proceedings Volume 7969, 79691C (2011) https://doi.org/10.1117/12.879609

KEYWORDS: Extreme ultraviolet lithography, Ions, Etching, Extreme ultraviolet, Silicon, Image resolution, Reflectivity, Ion beams, Mirrors, Ruthenium

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Proceedings Article | 25 September 2010 Paper

Study of EUV mask defect repair using FIB method

Tsuyoshi Amano, Noriaki Takagi, Hiroyuki Shigemura, Tsuneo Terasawa, Osamu Suga, Kensuke Shiina, Fumio Aramaki, Anto Yasaka, Yuichi Inazuki, Naoya Hayashi

Proceedings Volume 7823, 782323 (2010) https://doi.org/10.1117/12.864213

KEYWORDS: Photomasks, Extreme ultraviolet, Etching, Cadmium sulfide, Image processing, Scanning electron microscopy, Transmission electron microscopy, Semiconducting wafers, Carbon, Ions

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Proceedings Article | 27 May 2010 Paper

FIB-CVD technology for EUV mask repair

Tsuyoshi Amano, Noriaki Takagi, Hiroyuki Shigemura, Tsuneo Terasawa, Osamu Suga, Kensuke Shiina, Fumio Aramaki, Tomokazu Kozakai, Osamu Matsuda, Anto Yasaka

Proceedings Volume 7748, 77481I (2010) https://doi.org/10.1117/12.867233

KEYWORDS: Chemical vapor deposition, Photomasks, Tungsten, Extreme ultraviolet, Carbon, Silicon, Gallium, Extreme ultraviolet lithography, Chemical analysis, Vacuum ultraviolet

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Proceedings Article | 11 May 2009 Paper

FIB mask repair technology for EUV mask

Tsuyoshi Amano, Yasushi Nishiyama, Hiroyuki Shigemura, Tsuneo Terasawa, Osamu Suga, Kensuke Shiina, Fumio Aramaki, Anto Yasaka, Tsukasa Abe, Hiroshi Mohri

Proceedings Volume 7379, 73792L (2009) https://doi.org/10.1117/12.824335

KEYWORDS: Photomasks, Carbon, Etching, Extreme ultraviolet, Hydrogen, Chemical vapor deposition, Contamination, Cadmium sulfide, Extreme ultraviolet lithography, Scanning electron microscopy

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Proceedings Article | 17 October 2008 Paper

Study of EUVL mask defect repair using FIB-GAE method

Tsuyoshi Amano, Yasushi Nishiyama, Hiroyuki Shigemura, Tsuneo Terasawa, Osamu Suga, Kensuke Shiina, Fumio Aramaki, Ryoji Hagiwara, Anto Yasaka

Proceedings Volume 7122, 71222H (2008) https://doi.org/10.1117/12.801214

KEYWORDS: Etching, Photomasks, Extreme ultraviolet lithography, Bridges, Scanning electron microscopy, Image processing, Extreme ultraviolet, Semiconducting wafers, Chromium, Reflectivity

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Proceedings Article | 17 October 2008 Paper

Ga implantation and interlayer mixing during FIB repair of EUV mask defects

Yasushi Nishiyama, Tsuyoshi Amano, Hiroyuki Shigemura, Tsuneo Terasawa, Osamu Suga, Tomokazu Kozakai, Fumio Aramaki, Kensuke Shiina, Anto Yasaka, Ryoji Hagiwara

Proceedings Volume 7122, 71222J (2008) https://doi.org/10.1117/12.801428

KEYWORDS: Gallium, Reflectivity, Etching, Chromium, Silicon, Extreme ultraviolet, Chemical species, Ions, Absorption, Molybdenum

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Proceedings Article | 23 October 2006 Paper

Advanced photomask repair technology for 65-nm lithography

Fumio Aramaki, Tomokazu Kozakai, Masashi Muramatsu, Yasuhiko Sugiyama, Yoshihiro Koyama, Osamu Matsuda, Katsumi Suzuki, Mamoru Okabe, Toshio Doi, Ryoji Hagiwara, Tatsuya Adachi, Anto Yasaka, Yoshiyuki Tanaka, Osamu Suga, Naoki Nishida, Youichi Usui

Proceedings Volume 6349, 63491E (2006) https://doi.org/10.1117/12.691195

KEYWORDS: Photomasks, Etching, Computer aided design, Lithography, Transmittance, Process control, Opacity, Data processing, Scanning electron microscopy, CAD systems

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Proceedings Article | 20 May 2006 Paper

Advanced photomask repair technology for 65-nm lithography

Fumio Aramaki, Tomokazu Kozakai, Yasuhiko Sugiyama, Masashi Muramatsu, Yoshihiro Koyama, Osamu Matsuda, Katsumi Suzuki, Mamoru Okabe, Ryoji Hagiwara, Anto Yasaka, Tatsuya Adachi, Yoshiyuki Tanaka, Osamu Suga, Naoki Nishida, Youichi Usui

Proceedings Volume 6283, 628310 (2006) https://doi.org/10.1117/12.681859

KEYWORDS: Etching, Photomasks, Quartz, Chromium, Transmittance, Scanning electron microscopy, Lithography, Visibility, Critical dimension metrology, Sensors

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Showing 5 of 11 publications

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