Dr. Garth C. Robins Profile

Dr. Garth C. Robins

Sr Optical Engineer at Lockheed Martin Advanced Technology Ctr

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Author

Publications (12)

Proceedings Article | 11 July 2008 Paper

LOTIS at completion of Collimator integration

R. Bell, G. Robins, C. Eugeni, G. Cuzner, S. Hutchison, S. H. Baily, B. Ceurden, J. Hagen, K. Kenagy, H. M. Martin, M. Tuell, M. Ward, S. C. West

Proceedings Volume 7017, 70170D (2008) https://doi.org/10.1117/12.791889

KEYWORDS: Mirrors, Collimators, Optical testing, Wavefronts, Secondary tip-tilt mirrors, Control systems, Vibration isolation, Integrated optics, Actuators, Space telescopes

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Proceedings Article | 23 June 2006 Paper

Practical aspects of image system validation using trans-illumination

Andrew Cochrane, Garth Robins, Gary Baker, Raymond Bell, Vassilis Zarifis, Bruce Herman

Proceedings Volume 6271, 62711D (2006) https://doi.org/10.1117/12.672738

KEYWORDS: Diffusers, Modulation transfer functions, Imaging systems, Fourier transforms, Coherence imaging, Scattering, Coherence (optics), Monte Carlo methods, Solids, Telescopes

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Proceedings Article | 12 May 2005 Paper

Are pattern and probe aberration monitors ready for prime time?

Garth Robins, Andrew Neureuther

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.600611

KEYWORDS: Photomasks, Phase shifts, Scanning electron microscopy, Semiconducting wafers, Electromagnetism, Etching, Reticles, Polarization, Charge-coupled devices, Mask making

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Proceedings Article | 6 December 2004 Paper

Characterizing the demons in high-NA phase-shifting masks

Garth Robins, Andrew Neureuther

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.568758

KEYWORDS: Photomasks, Scanning electron microscopy, Phase shifts, Photoresist materials, Electromagnetism, Polarization, Semiconducting wafers, Lithography, Imaging systems, Monochromatic aberrations

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Proceedings Article | 28 May 2004 Paper

Interferometric-probe aberration monitor performance in the production environment

Garth Robins, Andrew Neureuther, Mircea Dusa, Jongwook Kye

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.536596

KEYWORDS: Monochromatic aberrations, Printing, Scanning electron microscopy, Interferometry, Spherical lenses, Target detection, Photomasks, Phase shifts, Scanners, Semiconducting wafers

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Proceedings Article | 3 May 2004 Paper

Feature level test patterns for characterizing residual process effects

Andrew Neureuther, Gregory McIntyre, Frank Gennari, Michael Lam, Jason Cain, Garth Robins, Edward Huang, Jihong Choi, Ling Wang, Lei Yuan, Hideaki Oshima

Proceedings Volume 5379, (2004) https://doi.org/10.1117/12.540685

KEYWORDS: Plasma etching, Chemical mechanical planarization, Photomasks, Computer aided design, Optical proximity correction, Electronics, Etching, Metrology, Design for manufacturability, Prototyping

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Proceedings Article | 17 December 2003 Paper

Interferometric-probe aberration monitors: aerial image and in-resist performance

Garth Robins, Mircea Dusa, Bernd Geh, Andrew Neureuther

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518603

KEYWORDS: Monochromatic aberrations, Printing, Photomasks, Point spread functions, Semiconducting wafers, Interferometry, Target detection, Electromagnetism, Phase shifts, Scanners

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Proceedings Article | 26 June 2003 Paper

Experimental assessment of pattern and probe-based aberration monitors

Garth Robins, Andrew Neureuther

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485491

KEYWORDS: Monochromatic aberrations, Photomasks, Spherical lenses, Point spread functions, Phase shifts, Calibration, Scanning electron microscopy, Printing, Charge-coupled devices, Interferometry

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Proceedings Article | 30 July 2002 Paper

Illumination, mask, and tool effects on pattern and probe-based aberration monitors

Garth Robins, Andrew Neureuther

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474500

KEYWORDS: Monochromatic aberrations, Phase shifts, Photomasks, Spherical lenses, Mask making, Lithographic illumination, Optics manufacturing, Optical lithography, Optical alignment, Tolerancing

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Proceedings Article | 12 July 2002 Paper

Validation of the aberration-pattern-matching OPC strategy

Frank Gennari, Garth Robins, Andrew Neureuther

Proceedings Volume 4692, (2002) https://doi.org/10.1117/12.475679

KEYWORDS: Monochromatic aberrations, Binary data, Optical proximity correction, Spherical lenses, Phase shifts, Computer aided design, Electronic design automation, Fourier transforms, Photomasks, Image processing

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Proceedings Article | 14 September 2001 Paper

LAVA web-based remote simulation: enhancements for education and technology innovation

Sang Il Lee, Ka Chun Ng, Takashi Orimoto, Jason Pittenger, Toshi Horie, Konstantinos Adam, Mosong Cheng, Ebo Croffie, Yunfei Deng, Frank Gennari, Thomas Pistor, Garth Robins, Mike Williamson, Bo Wu, Lei Yuan, Andrew Neureuther

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435691

KEYWORDS: Printing, Java, Photomasks, Diffusion, Near field, Computer simulations, Optical simulations, Lithography, Human-machine interfaces, Etching

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Proceedings Article | 5 September 2001 Paper

Simulation of image quality issues at low k1 for 100-nm lithography

Andrew Neureuther, Konstantinos Adam, Shoji Hotta, Thomas Pistor, Garth Robins, Yunfei Deng

Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438395

KEYWORDS: Photomasks, Monochromatic aberrations, Phase shifts, Lithography, Printing, Quartz, Image quality, Extreme ultraviolet, Spherical lenses, Near field

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Showing 5 of 12 publications

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