Dr. Gary S. Calabrese Profile

Dr. Gary S. Calabrese

VP & CTO at Rohm and Haas Electronic Materials, LLC

SPIE Involvement:

Author

Publications (6)

SPIE Journal Paper | 1 October 1993

Process techniques for improving performance of positive tone silylation

Edward Pavelchek, Gary Calabrese, John Bohland, Bruce Dudley, Susan Jones, Peter Freeman

OE, Vol. 32, Issue 10, (October 1993) https://doi.org/10.1117/12.10.1117/12.146858

KEYWORDS: Silicon, Semiconducting wafers, Photoresist processing, Scanning electron microscopy, Reactive ion etching, Etching, Deep ultraviolet, Image processing, Glasses, Manufacturing

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Proceedings Article | 15 September 1993 Paper

Processing techniques for improving performance of positive-tone silylation

Edward Pavelchek, Gary Calabrese, Bruce Dudley, Susan Jones, Peter Freeman, John Bohland, Roger Sinta

Proceedings Volume 1925, (1993) https://doi.org/10.1117/12.154760

KEYWORDS: Silicon, Photoresist processing, Semiconducting wafers, Scanning electron microscopy, Reactive ion etching, Etching, Manufacturing, Image processing, Very large scale integration, Deep ultraviolet

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Proceedings Article | 1 June 1992 Paper

Positive-tone surface imaging: methodologies for analysis and process control

Susan Jones, Peter Freeman, Edward Pavelchek, John Bohland, Bruce Dudley, Gary Calabrese

Proceedings Volume 1673, (1992) https://doi.org/10.1117/12.59843

KEYWORDS: Silicon, Process control, Photoresist processing, Plasma, Scanning electron microscopy, Image processing, Integrated circuits, Metrology, Inspection, Semiconducting wafers

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Proceedings Article | 1 July 1991 Paper

Simulation of an advanced negative i-line photoresist

Eytan Barouch, Uwe Hollerbach, Steven Orszag, Mary Allen, Gary Calabrese

Proceedings Volume 1463, (1991) https://doi.org/10.1117/12.44793

KEYWORDS: Photoresist materials, Diffusion, Computer simulations, Absorption, Image processing, Optical lithography, Photomicroscopy, Chemical elements, Numerical analysis, Systems modeling

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Proceedings Article | 1 June 1991 Paper

Novel surface imaging masking technique for high-aspect-ratio dry etching applications

Gary Calabrese, Livingstone Abali, John Bohland, Edward Pavelchek, Prasit Sricharoenchaikit, Gerald Vizvary, Stephen Bobbio, Patrick Smith

Proceedings Volume 1466, (1991) https://doi.org/10.1117/12.46401

KEYWORDS: Photoresist materials, Etching, Nickel, Photoresist developing, Metals, Aluminum, Printing, Plasma etching, Transmission electron microscopy, Palladium

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Proceedings Article | 1 June 1990 Paper

Chemically amplified resists for I-line and G-line applications

Amanda Berry, Wayne Feely, Stephen Thompson, Gary Calabrese, Roger Sinta, Angelo Lamola, James Thackeray, George Orsula

Proceedings Volume 1262, (1990) https://doi.org/10.1117/12.20113

KEYWORDS: Silver, Near ultraviolet, Lithography, Luminescence, Phosphorescence, Absorption, Absorbance, Chemically amplified resists, Spectroscopy, Oxidation

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Showing 5 of 6 publications

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