Dr. Gene E. Parris Profile

Dr. Gene E. Parris

at Air Products and Chemicals Inc

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Author

Publications (2)

Proceedings Article | 23 March 2007 Paper

Formulated surface conditioners in 50-nm immersion lithography: simultaneously reducing pattern collapse and line-width roughness

Masakazu Sanada, Manuel Jaramillo, Gene Parris, Stephan Sinkwitz, Suping Wang, Minoru Sugiyama, Patrick Wong

Proceedings Volume 6519, 651927 (2007) https://doi.org/10.1117/12.712188

KEYWORDS: Line width roughness, Electroluminescence, Semiconducting wafers, Lithography, Immersion lithography, Finite element methods, Photoresist processing, Scanners, Scanning electron microscopy, Optical lithography

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Proceedings Article | 12 May 2005 Paper

High refractive index immersion fluids for 193 nm immersion lithography

Peng Zhang, Xiaoping Gao, Bridgette Budhlall, Zarka Zarkov, Simon Kaplan, Brenda Ross, John Burnett, Gene Parris

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.600025

KEYWORDS: Refractive index, Absorbance, Water, Photoresist materials, Immersion lithography, Absorption, Microfluidics, Ultraviolet radiation, Semiconducting wafers, Fluid dynamics

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