Dr. Geoffrey W. Burr
Research Associate at IBM Research - Almaden
SPIE Involvement:
Author
Publications (25)

Proceedings Article | 16 August 2019 Presentation
Proceedings Volume 10958, 109580U (2019) https://doi.org/10.1117/12.2515630
KEYWORDS: Analog electronics, Neural networks, Algorithm development, Evolutionary algorithms, Tolerancing, Applied physics, Computer architecture, Structural design, Digital electronics, Lithography

Proceedings Article | 17 May 2011 Paper
Mathieu Mivelle, Geoffrey Burr, Ulrich Fischer, Thierry Grosjean, Fadi Baida
Proceedings Volume 8070, 807005 (2011) https://doi.org/10.1117/12.886983
KEYWORDS: Magnetism, Metals, Antennas, Near field optics, Dielectrics, Electromagnetism, Near field, Interfaces, Metamaterials, Nanoantennas

Proceedings Article | 16 March 2010 Paper
Jon Lee, Azalia Krasnoperova, Lei Zhuang, Daniel Corliss, Emily Gallagher, Kafai Lai, Michael Lam, Hidemasa Muta, Tadanobu Inoue, Laszlo Ladanyi, Tom Faure, Nick Cobb, Young Kim, Phil Strenski, Francisco Barahona, Alexander Tritchkov, Yuri Granik, Greg McIntyre, Jason Meiring, Aasutosh Dave, Jaione Tirapu-Azpiroz, Scott Halle, Kehan Tian, Andreas Waechter, Daniele Scarpazza, Alfred Wagner, Alan Rosenbluth, Moutaz Fakhry, Saeed Bagheri, Gabriel Berger, David Melville, Mike Hibbs, Geoffrey Burr, Kostas Adam, Masaharu Sakamoto
Proceedings Volume 7640, 764006 (2010) https://doi.org/10.1117/12.846716
KEYWORDS: Source mask optimization, Photomasks, Metals, Lithography, Optical proximity correction, Line edge roughness, Resolution enhancement technologies, Diffractive optical elements, Semiconducting wafers, Scanning electron microscopy

Proceedings Article | 30 September 2009 Paper
Proceedings Volume 7488, 74882D (2009) https://doi.org/10.1117/12.833739
KEYWORDS: Photomasks, Polarization, Electromagnetism, Semiconducting wafers, Data modeling, Lithography, Calibration, Diffraction, Optical proximity correction, Binary data

Proceedings Article | 23 March 2009 Paper
Jed Rankin, Robert Davis, John Bruley, Michael Pike, Frances Houle, Alfred Wagner, Andrew Watts, Philip Flaitz, Geoffrey Burr, Dolores Miller, William Hinsberg
Proceedings Volume 7272, 727215 (2009) https://doi.org/10.1117/12.813934
KEYWORDS: Photomasks, Chromium, Semiconducting wafers, Binary data, Manufacturing, Diffusion, Transmission electron microscopy, Roads, Photoresist materials, Oxidation

Showing 5 of 25 publications
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