Geoffrey A. Gaines
at Lawrence Berkeley National Lab
SPIE Involvement:
Author
Publications (22)

Proceedings Article | 23 March 2020 Presentation + Paper
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Mirrors, Image processing, Scanners, Scanning electron microscopy, Projection systems, Vibration isolation, Semiconducting wafers, Camera shutters

Proceedings Article | 26 March 2019 Presentation + Paper
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Monochromatic aberrations, Optical lithography, Image processing, Scanning electron microscopy, Photoresist materials, Projection systems, Line width roughness, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 26 March 2019 Paper
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Diffraction, Monochromatic aberrations, Optical design, Sensors, Interferometry, Wavefronts, Multiplexing, Optical alignment, Diffraction gratings, Shearing interferometers

Proceedings Article | 12 October 2018 Presentation
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Monochromatic aberrations, Data modeling, Error analysis, Interferometry, Wavefronts, Objectives, Optical resolution, Extreme ultraviolet, Projection lithography, Shearing interferometers

Proceedings Article | 3 April 2018 Paper
Proc. SPIE. 10570, International Conference on Space Optics — ICSO 1997

Showing 5 of 22 publications
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