George E. Bailey
Director, Technical Marketing at Synopsys Inc
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Publications (21)

Proceedings Article | 4 March 2010 Paper
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Optical proximity correction, Scanners, Photomasks, Fiber optic illuminators, Cadmium, Integrated circuits, Metrology, Tolerancing, Integrated optics, Diffraction

Proceedings Article | 31 October 2007 Paper
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Process modeling, Data modeling, Calibration, Image processing, Optical proximity correction, Lithography, Semiconducting wafers, Geometrical optics, Printing, Integrated circuits

Proceedings Article | 12 April 2007 Paper
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Calibration, Optical proximity correction, Scanning electron microscopy, Process modeling, Data modeling, Databases, Metrology, Semiconducting wafers, Detection and tracking algorithms, Visualization

Proceedings Article | 28 March 2007 Paper
Proc. SPIE. 6521, Design for Manufacturability through Design-Process Integration
KEYWORDS: Calibration, Optical proximity correction, Data modeling, Scanning electron microscopy, Model-based design, Critical dimension metrology, Process modeling, Manufacturing, Data processing, Metrology

Proceedings Article | 28 March 2007 Paper
Proc. SPIE. 6521, Design for Manufacturability through Design-Process Integration
KEYWORDS: Calibration, Data modeling, Image processing, Process modeling, Scanning electron microscopy, Optical proximity correction, Photoresist processing, Feature extraction, Optical lithography, Printing

Showing 5 of 21 publications
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