Mr. George Mirth Profile

George Mirth

Director/Strategic Accounts at Intermolecular Inc

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Author

Publications (5)

Proceedings Article | 22 September 1995 Paper

Reduction of post develop residue using optimal developer chemistry and develop/rinse processes

George Mirth

Proceedings Volume 2635, (1995) https://doi.org/10.1117/12.221453

KEYWORDS: Semiconducting wafers, Photoresist developing, Photoresist materials, Chemistry, Particles, Lithography, Silicon, Chemical analysis, Microscopes, Inspection

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Proceedings Article | 9 June 1995 Paper

Profile defects in novolac/DNQ resists: I. formation of microgrooves

Peter Trefonas, George Mirth, Michael Monaghan, Pamela Turci, L. DeJordy, Catherine Meister

Proceedings Volume 2438, (1995) https://doi.org/10.1117/12.210345

KEYWORDS: Interfaces, Polymers, Picture Archiving and Communication System, Semiconducting wafers, Silicon, Head-mounted displays, Lithography, Standards development, Photoresist processing, Molecules

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Proceedings Article | 16 May 1994 Paper

Process tube characterization method for photoresist and process comparison

George Mirth, Joseph Pellegrini

Proceedings Volume 2195, (1994) https://doi.org/10.1117/12.175399

KEYWORDS: Photoresist processing, Semiconducting wafers, Photoresist materials, Critical dimension metrology, Scanning electron microscopy, Data modeling, Nickel, Visualization, Detection and tracking algorithms, Astatine

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Proceedings Article | 8 August 1993 Paper

Determine submicron process window volume with simulator tools

Mircea Dusa, Linard Karklin, Mark Goldmann, William Gouin, George Mirth

Proceedings Volume 1927, (1993) https://doi.org/10.1117/12.150460

KEYWORDS: Photomasks, Fiber optic illuminators, Thin films, Image processing, Lithography, Oxides, Optical lithography, Photoresist processing, Statistical analysis, Reflectivity

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Proceedings Article | 4 August 1993 Paper

Application-specific microscopy for half-micron metrology

Mircea Dusa, Guoqing Xiao, Frank Menagh, Erik Rauch, William Gouin, George Mirth

Proceedings Volume 1926, (1993) https://doi.org/10.1117/12.149008

KEYWORDS: Metrology, Confocal microscopy, Microscopy, Lithography, 3D metrology, Imaging systems, Oxides, Scanning electron microscopy, Optical lithography, Photomasks

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