Dr. Gerald A. Dicks Profile

Dr. Gerald A. Dicks

at Univ of Wisconsin Madison

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Author

Publications (10)

Proceedings Article | 21 June 2006 Paper

Characterizing the response of an EUV reticle during electrostatic chucking

Roxann Engelstad, Edward Lovell, Andrew Mikkelson, Madhura Nataraju, Vasu Ramaswamy, Jaewoong Sohn, Gerald Dicks, Amr Abdo, Richard Tejeda

Proceedings Volume 6281, 628107 (2006) https://doi.org/10.1117/12.692727

KEYWORDS: Reticles, Particles, Extreme ultraviolet lithography, Photomasks, Extreme ultraviolet, Data modeling, Zerodur, Glasses, 3D modeling, Thermal modeling

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Proceedings Article | 23 March 2006 Paper

Assessment of electron projection lithography mask membrane image placement accuracy due to fabrication processes

Michael Boruszewski, Roxann Engelstad, Gerald Dicks, Hiroshi Sakaue, Hiroshi Arimoto

Proceedings Volume 6151, 61511J (2006) https://doi.org/10.1117/12.657659

KEYWORDS: Photomasks, Picosecond phenomena, Silicon carbide, Mask making, Metrology, Electron beam lithography, Projection lithography, Image processing, 3D modeling, Etching

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Proceedings Article | 6 December 2004 Paper

Analysis and control of template distortions in Step-and-Flash Imprint Lithography templates

Scott Schuetter, Gerald Dicks, Gregory Nellis, Roxann Engelstad

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569316

KEYWORDS: Nanoimprint lithography, Liquids, Fluid dynamics, Capillaries, Quartz, Absorption, Computational fluid dynamics, Computer simulations, Lithography, Silicon

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Nanoimprint lithography (NIL) was placed on the 2004 ITRS Roadmap, thus signifying its growing potential as a viable next-generation lithography technique. A particularly promising NIL technology is Step-and-Flash Imprint Lithography in which the pattern from a quartz template is transferred into a UV-curable silicon-rich monomer. The process of squeezing the monomer film during the imprint process produces significant flow-related pressures on the template which result in out-of-plane distortions (OPD). These OPD inherently produce in-plane distortions which compromise the quality of the resulting features. A single droplet imprint process, wherein a single puddle of monomer is used to cover the entire active area, suffers from throughput limitations due to the low imprint velocities that are required to control the flow-related pressures exerted on the template. In response to these limitations, recent research has focused on a multiple droplet imprint process wherein many droplets are dispensed and coalesce during the imprint process, resulting in lower flow-related pressures. In this paper, a numerical model is described that is capable of predicting both the pressures and the template distortions during a multiple droplet imprint process. The model consists of a finite element structural model of the template interfaced to a fluid-dynamic model of the flow through the gap; the distortion of the template affects the pressure applied on the template and vice versa, therefore a coupled, fluid-structure model is required. The pressure distribution during the imprint process is described by an analytical solution to the Reynolds equation that is modified to account for the coalescing process as well as the affects of absorption and surface tension. The modified solution is developed and verified through the use of computational fluid dynamic simulations. Results are described for a nominal set of conditions and a parametric study of the effect of droplet density is presented.

Proceedings Article | 6 December 2004 Paper

The influence of an electrostatic pin chuck on EUV mask flatness

Gerald Dicks, Andrew Mikkelson, Roxann Engelstad

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569034

KEYWORDS: Photomasks, Extreme ultraviolet, Dielectrics, 3D modeling, Optical lithography, Reticles, Extreme ultraviolet lithography, Electrodes, Capacitance, Interferometry

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Proceedings Article | 2 June 2004 Paper

Predicting microfluidic response during immersion lithography scanning

Alexander Wei, Gerald Dicks, Amr Abdo, Gregory Nellis, Roxann Engelstad, Jaehyuk Chang, Edward Lovell, William Beckman

Proceedings Volume 5504, (2004) https://doi.org/10.1117/12.568024

KEYWORDS: Liquids, Semiconducting wafers, Immersion lithography, Polymers, Microfluidics, Refraction, Absorption, Optical simulations, Refractive index, Wafer-level optics

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Proceedings Article | 20 May 2004 Paper

Controlling template response during imprint lithography

Scott Schuetter, Gerald Dicks, Greg Nellis, Roxann Engelstad, Edward Lovell, Brad Schulteis

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.546925

KEYWORDS: Lithography, Semiconducting wafers, Liquids, Fluid dynamics, Nanoimprint lithography, Performance modeling, Atmospheric modeling, Mechanics, Solids, Chemical elements

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Proceedings Article | 20 May 2004 Paper

Predicting image placement accuracy of x-ray masks

Gerald Dicks, Roxann Engelstad, Edward Lovell, Brent Boerger, Daniel Fleming, Karen Brown

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.546200

KEYWORDS: Photomasks, Semiconducting wafers, Image processing, Silicon carbide, X-rays, 3D modeling, Silicon, Etching, X-ray lithography, Chromium

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Proceedings Article | 22 January 2001 Paper

SCALPEL mask parametric study

Gerald Dicks, Roxann Engelstad, Edward Lovell, James Liddle

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410749

KEYWORDS: Metals, Photomasks, Kinematics, Charged-particle lithography, Lithography, Projection lithography, Device simulation, Scattering, Cobalt, Electron beam lithography

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Proceedings Article | 25 June 1999 Paper

Finite element modeling of SCALPEL masks

Roxann Engelstad, Edward Lovell, Gerald Dicks, Carl Martin, Michael Schlax, William Semke, James Liddle, Anthony Novembre

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351085

KEYWORDS: Photomasks, Charged-particle lithography, Semiconducting wafers, Finite element methods, Silicon, 3D modeling, Data modeling, Radiation effects, Mechanics, Device simulation

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Proceedings Article | 5 June 1998 Paper

Equivalent modeling of SCALPEL mask membrane distortions

Gerald Dicks, Roxann Engelstad, Edward Lovell, James Liddle

Proceedings Volume 3331, (1998) https://doi.org/10.1117/12.309623

KEYWORDS: Photomasks, Charged-particle lithography, Semiconducting wafers, Lithography, Silicon, Computer hardware, Solids, Scattering, Semiconductors, Integrated circuits

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Showing 5 of 10 publications

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