Mr. Gerald Kreindl Profile

Gerald Kreindl

Business Development Manager at EV Group

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 20 December 2013 Paper

Nanoimprint lithography for microfluidics manufacturing

Gerald Kreindl, Thorsten Matthias

Proceedings Volume 8923, 892330 (2013) https://doi.org/10.1117/12.2035609

KEYWORDS: Nanoimprint lithography, Lithography, Microfluidics, Nanotechnology, Manufacturing, Polymers, Printing, Raman spectroscopy, Nanolithography, Silicon

Read Abstract +

Proceedings Article | 17 April 2012 Paper

Nanoimprint activities in Austria in the research project cluster NILaustria

Michael Mühlberger, Hannes Fachberger, Iris Bergmair, Michael Rohn, Bernd Dittert, Rainer Schöftner, Thomas Rothländer, Dieter Nees, Ursula Palfinger, Anja Haase, Alexander Fian, Martin Knapp, Claudia Preininger, Gerald Kreindl, Michael Kast, Thomas Fromherz

Proceedings Volume 8352, 83520O (2012) https://doi.org/10.1117/12.921324

KEYWORDS: Nanoimprint lithography, Nanostructures, Organic electronics, Nanolithography, Transistors, Nanostructuring, Printing, Silicon, Electrodes, Metamaterials

Read Abstract +

Proceedings Article | 4 April 2011 Paper

Soft UV-NIL at the 12.5 nm scale

G. Kreindl, M. Kast, D. Treiblmayr, T. Glinsner, E. Platzgummer, H. Loeschner, P. Joechl, S. Eder-Kapl, T. Nartz, M. Muehlberger, I. Bergmair, M. Boehm, R. Schoeftner

Proceedings Volume 7970, 79701M (2011) https://doi.org/10.1117/12.870524

KEYWORDS: Nanoimprint lithography, Scanning electron microscopy, Lithography, Polymers, Ion beam lithography, Silicon, Ultraviolet radiation, Nanofabrication, Silver, Manufacturing

Read Abstract +

Proceedings Article | 3 April 2010 Paper

Fully automated hot embossing processes utilizing high resolution working stamps

T. Glinsner, T. Veres, G. Kreindl, E. Roy, K. Morton, T. Wieser, C. Thanner, D. Treiblmayr, R. Miller, P. Lindner

Proceedings Volume 7637, 76370S (2010) https://doi.org/10.1117/12.846841

KEYWORDS: Polymers, Nanoimprint lithography, Microfluidics, Silicon, Optical alignment, Diagnostics, Biosensing, Nickel, Semiconducting wafers, Lithography

Read Abstract +

Proceedings Article | 18 March 2009 Paper

Industrial applications demanding low and high resolution features realized by soft UV-NIL and hot embossing

R. Miller, T. Glinsner, G. Kreindl, P. Lindner, M. Wimplinger

Proceedings Volume 7271, 72712J (2009) https://doi.org/10.1117/12.814102

KEYWORDS: Silicon, Materials processing, Polymers, Semiconducting wafers, Nanoimprint lithography, Lithography, Glasses, Ultraviolet radiation, Quartz, Manufacturing

Read Abstract +

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years