Gerd Ballhorn
at Infineon Technologies AG
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 28 May 2003 Paper
Proc. SPIE. 5148, 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents
KEYWORDS: Data modeling, Etching, Dry etching, Chromium, Photomasks, Plasma etching, Convolution, Critical dimension metrology, Chlorine, Data corrections

Proceedings Article | 27 December 2002 Paper
Proc. SPIE. 4889, 22nd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Sun, Control systems, Data processing, Distributed computing, Computed tomography, Explosives, Beam shaping, Computer aided design, Data conversion, Vestigial sideband modulation

Proceedings Article | 27 December 2002 Paper
Proc. SPIE. 4889, 22nd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Data modeling, Etching, Dry etching, Chromium, Photomasks, Computed tomography, Plasma etching, Convolution, Critical dimension metrology, Data corrections

Proceedings Article | 1 August 2002 Paper
Proc. SPIE. 4754, Photomask and Next-Generation Lithography Mask Technology IX
KEYWORDS: Electron beams, Sun, Silver, Photomasks, Computed tomography, Beam shaping, Optical proximity correction, Raster graphics, Data conversion, Vestigial sideband modulation

Proceedings Article | 11 March 2002 Paper
Proc. SPIE. 4562, 21st Annual BACUS Symposium on Photomask Technology
KEYWORDS: Sun, Distributed computing, Photomasks, Computed tomography, Beam shaping, Optical proximity correction, Local area networks, Data conversion, Data communications, Vestigial sideband modulation

Showing 5 of 6 publications
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