Dr. Gerhard Kunkel
at Qimonda Dresden GmbH & Co OHG
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 23 March 2006 Paper
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Electron beams, Manufacturing, Inspection, Scanning electron microscopy, Printing, Photomasks, Line width roughness, Critical dimension metrology, Line edge roughness, Semiconducting wafers

Proceedings Article | 12 May 2005 Paper
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Lithography, Monochromatic aberrations, Reticles, Metrology, Interferometers, Wavefronts, Projection systems, Semiconducting wafers, Phase shifts, Diffraction gratings

Proceedings Article | 28 May 2004 Paper
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Microscopes, Diffraction, Optical design, Reticles, Interferometers, Scanners, Manufacturing, Control systems, Neodymium, Semiconducting wafers

Proceedings Article | 28 May 2004 Paper
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Optical lithography, Photomasks, Resolution enhancement technologies

Proceedings Article | 26 June 2003 Paper
Proc. SPIE. 5040, Optical Microlithography XVI
KEYWORDS: Lithography, Reticles, Capacitors, Deep ultraviolet, Image registration, Semiconductor manufacturing, Critical dimension metrology, Semiconducting wafers, Tolerancing, Overlay metrology

Showing 5 of 11 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top