We have fabricated the near-ultraviolet (NUV) flip-chip (FC) light-emitting diodes (LEDs) with the high external quantum efficiency (EQE) using distributed Bragg reflectors (DBRs) and compared with conventional FC-LED using silver (Ag) reflector. Reflectance of Ag is very high (90 ~ 95 %) at visible spectrum region, but sharply decrease at NUV region. Therefore we used DBR composed of two different materials which have high-index contrast, such as TiO2 and SiO2. However, to achieve high-performance NUV flip-chip LEDs, we used Ta2O5 instead of TiO2 that absorbs lights of NUV region. Thus, we have designed a DBR composed of twenty pairs of Ta2O5 and SiO2 using optical coating design software. The DBR designed by our group achieves a reflectance of ~99 % in the NUV region (350 ~ 500 nm), which is much better than Ag reflector. Optical power is higher than the Ag-LED up to 22 % @ 390 nm.
In this study, high performance nitride-based flip-chip (FC) light-emitting diodes (LEDs) using optimized distributed bragg reflector (DBR) were fabricated and compared with conventional FC-LED using silver (Ag) reflector. Most of FCLEDs are using the silver (Ag) as reflector due to its superior reflectance at visual spectrum region. However, A silver has detrimental problems such as electro-chemical migration and agglomerations, which resulting in reliability issues such as degradation of power drop, unstable operating voltage and leakage issues. Our DBR structure was designed to have 99% at whole visible spectrum range (400~750nm), which is higher reflectance than silver reflector (90~95%). Optical power is higher than higher than the Ag-LED up to 30% @ 500mA. As the current increases up to 1A, the gap slightly decreased. Reliability test results show stable optical power, operating voltage, and leakage maintenance.
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