Gideon Gottlieb
Vice President Marketing and Sales Representative at Carl Zeiss SMS Ltd
SPIE Involvement:
Author
Publications (18)

Proceedings Article | 31 October 2007 Paper
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Signal attenuation, Scanners, Control systems, Scanning electron microscopy, Ultrafast lasers, Photomasks, Critical dimension metrology, Semiconducting wafers, Data corrections, Airborne remote sensing

Proceedings Article | 3 May 2007 Paper
Proc. SPIE. 6533, 23rd European Mask and Lithography Conference
KEYWORDS: Polarization, Birefringence, Signal attenuation, Image processing, Scanners, Process control, Photomasks, Critical dimension metrology, Chemical elements, Semiconducting wafers

Proceedings Article | 10 May 2005 Paper
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Lithography, Metrology, Cadmium, Etching, Quartz, Chromium, Photomasks, Critical dimension metrology, Photoresist processing, Semiconducting wafers

Proceedings Article | 20 August 2004 Paper
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Reticles, Metrology, Image segmentation, Image processing, Feature extraction, Scanning electron microscopy, Photomasks, Optical proximity correction, Algorithm development, OLE for process control

Proceedings Article | 24 May 2004 Paper
Proc. SPIE. 5375, Metrology, Inspection, and Process Control for Microlithography XVIII
KEYWORDS: Reticles, Metrology, Optical lithography, Inspection, Scanning electron microscopy, Process control, Shape analysis, Optical proximity correction, Algorithm development, Semiconducting wafers

Showing 5 of 18 publications
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