Dr. Gilroy J. Vandentop Profile

Dr. Gilroy J. Vandentop

Manager/Advanced Mask Technology at Intel Corp

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Author

Publications (6)

Proceedings Article | 7 April 2011 Paper

CD correction for half pitch 2x-nm on extreme ultraviolet lithography

Hajime Aoyama, Yuusuke Tanaka, Kazuo Tawarayama, Yukiyasu Arisawa, Taiga Uno, Takashi Kamo, Toshihiko Tanaka, Alan Myers, Yashesh Shroff, Tetsunori Murachi, Gilroy Vandentop, Ichiro Mori

Proceedings Volume 7969, 79691J (2011) https://doi.org/10.1117/12.878672

KEYWORDS: Critical dimension metrology, Scanning electron microscopy, Extreme ultraviolet lithography, Logic, Photomasks, Optical proximity correction, Model-based design, Lithography, Point spread functions, Electronic design automation

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Proceedings Article | 18 March 2009 Paper

Demonstration of full-field patterning of 32 nm test chips using EUVL

Gilroy Vandentop, Manish Chandhok, Ernisse Putna, Todd Younkin, James Clarke, Steven Carson, Alan Myers, Michael Leeson, Guojing Zhang, Ted Liang, Tetsunori Murachi

Proceedings Volume 7271, 727116 (2009) https://doi.org/10.1117/12.814436

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Inspection, Optical lithography, Extreme ultraviolet, Particles, Photoresist materials, Line width roughness, Reticles, Semiconducting wafers

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Proceedings Article | 29 May 2007 Paper

Progress on EUV mask fabrication for 32-nm technology node and beyond

Guojing Zhang, Pei-Yang Yan, Ted Liang, Seh-jin Park, Peter Sanchez, Emily Shu, Erdem Ultanir, Sven Henrichs, Alan Stivers, Gilroy Vandentop, Barry Lieberman, Ping Qu

Proceedings Volume 6607, 66070R (2007) https://doi.org/10.1117/12.728941

KEYWORDS: Extreme ultraviolet lithography, Photomasks, Inspection, Extreme ultraviolet, Multilayers, Reflectivity, Etching, Mask making, Metrology, Defect inspection

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Proceedings Article | 20 May 2006 Paper

EUV mask pattern defect printability

Ted Liang, Guojing Zhang, Patrick Naulleau, Alan Myers, Seh-Jin Park, Alan Stivers, Gilroy Vandentop

Proceedings Volume 6283, 62830K (2006) https://doi.org/10.1117/12.681844

KEYWORDS: Photomasks, Extreme ultraviolet, Inspection, Extreme ultraviolet lithography, Scanning electron microscopy, Printing, Cadmium, Photomicroscopy, Semiconducting wafers, Optical lithography

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Proceedings Article | 20 May 2006 Paper

EUV mask process development and integration

Guojing Zhang, Pei-Yang Yan, Ted Liang, Yan Du, Peter Sanchez, Seh-jin Park, Eric Lanzendorf, Chang Ju Choi, Emily Shu, Alan Stivers, Jeff Farnsworth, Kangmin Hsia, Manish Chandhok, Michael Leeson, Gilroy Vandentop

Proceedings Volume 6283, 62830G (2006) https://doi.org/10.1117/12.681839

KEYWORDS: Photomasks, Extreme ultraviolet, Etching, Reflectivity, Defect inspection, Extreme ultraviolet lithography, Inspection, Ruthenium, Image processing, Optical lithography

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Proceedings Article | 10 June 2004 Paper

Optical I/O technology for digital VLSI

Edris Mohammed, Thomas Thomas, Daoqiang Lu, Henning Braunisch, Steven Towle, Brandon Barnett, Ian Young, Gilroy Vandentop

Proceedings Volume 5358, (2004) https://doi.org/10.1117/12.530160

KEYWORDS: Vertical cavity surface emitting lasers, Waveguides, Transmitters, Clocks, Transceivers, Polymer multimode waveguides, Polymers, Receivers, Optoelectronics, Connectors

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Showing 5 of 6 publications

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