Dr. Gilroy J. Vandentop
Manager/Advanced Mask Technology at Intel Corp
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 7 April 2011 Paper
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Critical dimension metrology, Scanning electron microscopy, Extreme ultraviolet lithography, Logic, Photomasks, Optical proximity correction, Model-based design, Lithography, Point spread functions, Electronic design automation

Proceedings Article | 18 March 2009 Paper
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Photomasks, Extreme ultraviolet lithography, Inspection, Optical lithography, Extreme ultraviolet, Particles, Photoresist materials, Line width roughness, Reticles, Semiconducting wafers

Proceedings Article | 29 May 2007 Paper
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Extreme ultraviolet lithography, Photomasks, Inspection, Extreme ultraviolet, Multilayers, Reflectivity, Etching, Mask making, Metrology, Defect inspection

Proceedings Article | 20 May 2006 Paper
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Photomasks, Extreme ultraviolet, Etching, Reflectivity, Defect inspection, Extreme ultraviolet lithography, Inspection, Ruthenium, Image processing, Optical lithography

Proceedings Article | 20 May 2006 Paper
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Photomasks, Extreme ultraviolet, Inspection, Extreme ultraviolet lithography, Scanning electron microscopy, Printing, Cadmium, Photomicroscopy, Semiconducting wafers, Optical lithography

Showing 5 of 6 publications
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