Mr. Goji Wakamatsu Profile

Goji Wakamatsu

at JSR Corp

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Author

Publications (5)

Proceedings Article | 27 March 2014 Paper

Spin-on organic hardmask for topo-patterned substrate

Kazuhiko Komura, Yoshi Hishiro, Goji Wakamatsu, Yoshio Takimoto, Tomoki Nagai, Tooru Kimura, Yoshikazu Yamaguchi, Tsutomu Shimokawa, Greg Breyta, Noel Arellano, Srinivasan Balakrishnan, Luisa Bozano, Ananthakrishnan Sankaranarayanan, Daniel Sanders, Carl Larson, Martin Glodde, Anuja DeSilva, Krishna Bajjuri

Proceedings Volume 9051, 905115 (2014) https://doi.org/10.1117/12.2046357

KEYWORDS: Fourier transforms, Chemical vapor deposition, Photoresist materials, Resistance, Carbon, Photomasks, Optical lithography, Lithography, Glasses

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Proceedings Article | 20 March 2012 Paper

Investigation of pattern wiggling for spin-on organic hardmask materials

Tsutomu Shimokawa, Anuja DeSilva, Noel Arellano, Satoru Murakami, Yoshi Hishiro, Greg Breyta, Goji Wakamatsu, Yoshikazu Yamaguchi, Masayuki Motonari, Luisa Bozano, Kentaro Goto, Taiichi Furukawa, Carl Larson, Martin Glodde, Ratnam Sooriyakumaran

Proceedings Volume 8325, 83250T (2012) https://doi.org/10.1117/12.915698

KEYWORDS: Etching, Resistance, Hydrogen, Chemical vapor deposition, Fluorine, Fourier transforms, Optical lithography, Critical dimension metrology, Double patterning technology, Extreme ultraviolet

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Proceedings Article | 26 March 2010 Paper

Simplified double patterning process with non-topcoat self-freezing resist

Hiromitsu Tanaka, Makoto Sugiura, Michihiro Mita, Yutaka Kozuma, Yoshifumi Ogawa, Yoshikazu Yamaguchi, Takeo Shioya, Hiroaki Takikawa, Masafumi Hori, Koji Ito, Koichi Fujiwara, Yusuke Anno, Goji Wakamatsu, Kentaro Goto, Tomohisa Fujisawa, Tsutomu Shimokawa, Kenji Hoshiko

Proceedings Volume 7639, 76392Y (2010) https://doi.org/10.1117/12.846493

KEYWORDS: Double patterning technology, Photoresist processing, Lithography, Manufacturing, Optical lithography, Silica, Water, Immersion lithography, Critical dimension metrology, Extreme ultraviolet lithography

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Proceedings Article | 1 April 2009 Paper

Double patterning process with freezing technique

Tsutomu Shimokawa, Tomohiro Kakizawa, Goji Wakamatsu, Yoshikazu Yamaguchi, Michihiro Mita, Masafumi Hori, Shiro Kusumoto, Koichi Fujiwara, Kenji Hoshiko, Yusuke Anno, Takeo Shioya

Proceedings Volume 7273, 72730B (2009) https://doi.org/10.1117/12.814073

KEYWORDS: Double patterning technology, Lithography, Optical lithography, Photoresist processing, Manufacturing, Etching, Semiconducting wafers, Scanning electron microscopy, Image processing, Photomasks

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Proceedings Article | 26 March 2008 Paper

Sub-40-nm half-pitch double patterning with resist freezing process

Gouji Wakamatsu, Atsushi Nakamura, Tomoki Nagai, Tsutomu Shimokawa, Yoshikazu Yamaguchi, Takayoshi Abe, Yuusuke Anno, Masafumi Hori, Shiro Kusumoto, Tomohiro Kakizawa, Makoto Sugiura

Proceedings Volume 6923, 69230H (2008) https://doi.org/10.1117/12.772403

KEYWORDS: Double patterning technology, Critical dimension metrology, Lithography, Optical lithography, Photoresist processing, Immersion lithography, Scanning electron microscopy, Semiconducting wafers, Water, Etching

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