Dr. Gongfa Li Profile

Dr. Gongfa Li

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Publications (7)

SPIE Journal Paper | 7 March 2024

Lightweight monocular absolute depth estimation based on attention mechanism

Jiayu Jin, Bo Tao, Xinbo Qian, Jiaxin Hu, Gongfa Li

JEI, Vol. 33, Issue 02, 023010, (March 2024) https://doi.org/10.1117/12.10.1117/1.JEI.33.2.023010

KEYWORDS: Convolution, Cameras, Education and training, Image processing, Transformers, Depth maps, Data modeling, Sensors, Image restoration, Autonomous driving

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SPIE Journal Paper | 22 December 2022

Self-supervised monocular depth estimation in fog

Bo Tao, Jiaxin Hu, Du Jiang, Gongfa Li, Baojia Chen, Xinbo Qian

OE, Vol. 62, Issue 03, 031208, (December 2022) https://doi.org/10.1117/12.10.1117/1.OE.62.3.031208

KEYWORDS: Fiber optic gyroscopes, Visibility through fog, Visibility, Feature extraction, Image restoration, Light sources and illumination, Education and training, Image analysis, Depth maps, Optical engineering

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Proceedings Article | 20 December 2019 Paper

A novel 3D profile measurement method based on digital photoelastic technology

Guanjun Chen, Bo Tao, Gongfa Li, Shuang Xu, Fei Zeng

Proceedings Volume 11209, 112094O (2019) https://doi.org/10.1117/12.2549919

KEYWORDS: Photoelasticity, Fringe analysis, Digital photography, 3D image processing, Structured light, Phase shifts, Phase shifting

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SPIE Journal Paper | 24 January 2019

Polarization aberration analysis in lithographic tools

Shuang Xu, Bo Tao, Yongxing Guo, Gongfa Li

OE, Vol. 58, Issue 08, 082405, (January 2019) https://doi.org/10.1117/12.10.1117/1.OE.58.8.082405

KEYWORDS: Polarization, Lithography, Imaging systems, Distortion, Nanoimprint lithography, Optical engineering, Photomasks, Lithographic illumination, Zernike polynomials, Semiconducting wafers

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Proceedings Article | 15 November 2018 Paper

Separation of variables based method for fast calculation of imaging system in lithographic tools

Shuang Xu, Bo Tao, Yongxing Guo, Gongfa Li

Proceedings Volume 10964, 1096446 (2018) https://doi.org/10.1117/12.2506071

KEYWORDS: Lithography, Imaging systems, Optical lithography, Photomasks, Optical proximity correction, Optical imaging, Image processing, Resolution enhancement technologies, Algorithm development, Computer simulations

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Proceedings Article | 7 November 2018 Paper

Polarization aberration measurement of lithographic tools

Shuang Xu, Gongfa Li, Bo Tao, Yongxing Guo

Proceedings Volume 10819, 1081909 (2018) https://doi.org/10.1117/12.2500778

KEYWORDS: Polarization, Lithography, Zernike polynomials, Distortion, Imaging systems, Data modeling, Manufacturing

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Proceedings Article | 12 January 2018 Paper

Image based method for aberration measurement of lithographic tools

Shuang Xu, Bo Tao, Yongxing Guo, Gongfa Li

Proceedings Volume 10620, 106200C (2018) https://doi.org/10.1117/12.2287057

KEYWORDS: Lithography, Imaging systems, Zernike polynomials, Distortion, Photomasks, Systems modeling, Wavefront aberrations, Reconstruction algorithms, Phase measurement, Image transmission

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Showing 5 of 7 publications

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