Dr. Greg M. Yeric Profile

Dr. Greg M. Yeric

Senior Principle Engineer at ARM Inc

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Author

Publications (6)

Proceedings Article | 28 March 2017 Presentation + Paper

Efficient DSA-DP hybrid lithography conflict detection and guiding template assignment

Jiaojiao Ou, Brian Cline, Greg Yeric, David Pan

Proceedings Volume 10148, 101480C (2017) https://doi.org/10.1117/12.2258156

KEYWORDS: Directed self assembly, Error analysis, Nano opto mechanical systems, Computer simulations, Optical proximity correction, Lithography, Double patterning technology, Optical lithography, Photomasks, Shape analysis

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Proceedings Article | 15 March 2016 Paper

Standard cell pin access and physical design in advanced lithography

Xiaoqing Xu, Brian Cline, Greg Yeric, David Pan

Proceedings Volume 9780, 97800P (2016) https://doi.org/10.1117/12.2222289

KEYWORDS: Lithography, Optical lithography, Design for manufacturability, Computational lithography, Optical tracking, Standards development, Metals, Design for manufacturing, Photomasks, 193nm lithography, Legal, Double patterning technology

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SPIE Journal Paper | 3 February 2016

Systematic framework for evaluating standard cell middle-of-line robustness for multiple patterning lithography

Brian Cline, Greg Yeric, Bei Yu, David Pan, Xiaoqing Xu

JM3, Vol. 15, Issue 02, 021202, (February 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.2.021202

KEYWORDS: Lithography, Optical lithography, Photomasks, Standards development, Legal, Manufacturing, Logic, Electrochemical etching, Double patterning technology, Algorithms

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Proceedings Article | 18 March 2015 Paper

A systematic framework for evaluating standard cell middle-of-line (MOL) robustness for multiple patterning

Xiaoqing Xu, Brian Cline, Greg Yeric, Bei Yu, David Pan

Proceedings Volume 9427, 942707 (2015) https://doi.org/10.1117/12.2085918

KEYWORDS: Optical lithography, Standards development, 193nm lithography, Photomasks, Lithography, Double patterning technology, Legal, Logic, Design for manufacturability, Manufacturing

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Proceedings Article | 30 October 2007 Paper

Accurate lithography analysis for yield prediction

Greg Yeric, Babak Hatamian, Rahul Kapoor

Proceedings Volume 6730, 67300S (2007) https://doi.org/10.1117/12.746797

KEYWORDS: Optical proximity correction, Lithography, Calibration, Data modeling, Design for manufacturing, Photomasks, Process modeling, Silicon, Semiconducting wafers, Statistical modeling

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Proceedings Article | 2 June 2000 Paper

Design and analysis of across-chip linewidth variation for printed features at 130 nm and below

J. Fung Chen, Robert Socha, Kumar Puntambekar, Kurt Wampler, Roger Caldwell, Mircea Dusa, John Love, Greg Yeric, Brenda Stoner

Proceedings Volume 3998, (2000) https://doi.org/10.1117/12.386469

KEYWORDS: Reticles, Critical dimension metrology, Diffractive optical elements, Optical proximity correction, Scanning electron microscopy, Semiconducting wafers, Photomasks, Monochromatic aberrations, Printing, Mask making

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Showing 5 of 6 publications

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