Dr. Gregory R. Bogart Profile

Dr. Gregory R. Bogart

at Symphony Acoustics Inc

SPIE Involvement:

Author

Proceedings Article | 19 January 2005 Paper

Laterally deformable optical NEMS grating transducers for inertial sensing applications

Bianca Keeler, Gregory Bogart, Dustin Carr

Proceedings Volume 5592, (2005) https://doi.org/10.1117/12.571504

KEYWORDS: Transducers, Sensors, Nanoelectromechanical systems, Optical components, Silicon, Fiber optics sensors, Semiconducting wafers, Near field optics, Oxides, Microelectromechanical systems

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Proceedings Article | 24 April 2003 Paper

Optical MEMS devices for telecom systems

Flavio Pardo, Vladimir Aksyuk, Susanne Arney, H. Bair, Nagesh Basavanhally, David Bishop, Gregory Bogart, Cristian Bolle, J. Bower, Dustin Carr, H. Chan, Raymond Cirelli, E. Ferry, Robert Frahm, Arman Gasparyan, John Gates, C. Randy Giles, L. Gomez, Suresh Goyal, Dennis Greywall, Martin Haueis, R. Keller, Jungsang Kim, Fred Klemens, Paul Kolodner, Avi Kornblit, T. Kroupenkine, Warren Lai, Victor Lifton, Jian Liu, Yee Low, William Mansfield, Dan Marom, John Miner, David Neilson, Mark Paczkowski, C. Pai, A. Ramirez, David Ramsey, S. Rogers, Roland Ryf, Ronald Scotti, Herbert Shea, M. Simon, H. Soh, Hong Tang, J. Taylor, K. Teffeau, Joseph Vuillemin, J. Weld

Proceedings Volume 5116, (2003) https://doi.org/10.1117/12.499075

KEYWORDS: Mirrors, Electrodes, Silicon, Microelectromechanical systems, Switches, Reflectors, Semiconducting wafers, Microopto electromechanical systems, Oxides, Optical fabrication equipment

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Proceedings Article | 20 January 2003 Paper

Electrostatically actuated membrane mirrors for adaptive optics

Peter Kurczynski, Gregory Bogart, Warren Lai, Victor Lifton, William Mansfield, J. Anthony Tyson, Bernard Sadoulet, David Williams

Proceedings Volume 4983, (2003) https://doi.org/10.1117/12.473642

KEYWORDS: Electrodes, Mirrors, Silicon, Adaptive optics, Semiconducting wafers, Etching, Crystals, Actuators, Lithography, Microelectromechanical systems

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Proceedings Article | 21 July 2000 Paper

Etching 200-mm diameter SCALPEL masks with the ASE process

Ian Johnston, Huma Ashraf, Jy Bhardwaj, Janet Hopkins, Alan Hynes, Glenn Nicholls, Serrita McAuley, Stephen Hall, Lilian Atabo, Gregory Bogart, Avi Kornblit, Anthony Novembre

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390054

KEYWORDS: Etching, Semiconducting wafers, Photomasks, Silicon, Charged-particle lithography, Helium, Plasma etching, Wet etching, Plasma, Photoresist materials

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Proceedings Article | 30 August 1999 Paper

SCALPEL mask blank fabrication

Thomas Saunders, Myrtle Blakey, Carlos Caminos, Gregory Bogart, Reginald Farrow, Chester Knurek, Avi Kornblit, James Liddle, Anthony Novembre, Milton Peabody

Proceedings Volume 3874, (1999) https://doi.org/10.1117/12.361228

KEYWORDS: Photomasks, Etching, Silicon, Charged-particle lithography, Semiconducting wafers, Electron beam lithography, Lithography, Scattering, Crystals, Dry etching

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Proceedings Article | 25 June 1999 Paper

200-mm SCALPEL mask development

Gregory Bogart, Anthony Novembre, Avi Kornblit, Milton Peabody, Reginald Farrow, Myrtle Blakey, Richard Kasica, James Liddle, Thomas Saunders, Chester Knurek, Ian Johnston

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351089

KEYWORDS: Etching, Photomasks, Semiconducting wafers, Charged-particle lithography, Silicon, Crystals, Dry etching, Plasma, Wet etching, Photoresist materials

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SPIE Journal Paper | 1 May 1999

Fixed-polarizer ellipsometry: a simple technique to measure the thickness of very thin films

Brian Trotter, Garret Moddel, Rachel Ostroff, Gregory Bogart

OE, Vol. 38, Issue 05, (May 1999) https://doi.org/10.1117/12.10.1117/1.602049

KEYWORDS: Reflection, Polarizers, Thin films, Ellipsometry, Polarization, Calibration, Interfaces, Refractive index, Silicon, Sensors

Proceedings Article | 23 April 1999 Paper

Overview of SCALPEL mask technology

Gregory Bogart, Anthony Novembre, Avi Kornblit, Milton Peabody, Reginald Farrow, Myrtle Blakey, Richard Kasica, James Liddle, Thomas Saunders, Chester Knurek

Proceedings Volume 3665, (1999) https://doi.org/10.1117/12.346223

KEYWORDS: Photomasks, Semiconducting wafers, Silicon, Charged-particle lithography, Etching, Electron beam lithography, Crystals, Wet etching, Electron beams, Dry etching

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Showing 5 of 8 publications

Conference Committee Involvement (2)

Nanofabrication: Technologies, Devices, and Applications II

23 October 2005 | Boston, MA, United States

Nanofabrication: Technologies, Devices, and Applications

25 October 2004 | Philadelphia, Pennsylvania, United States

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