Dr. Gregory R. McIntyre
Director, Advanced Patterning Dept at imec
SPIE Involvement:
Author | Instructor
Publications (64)

Proceedings Article | 23 April 2018 Paper
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Optical lithography, Semiconductors, Lithography, Semiconducting wafers, Metals, Manufacturing, Double patterning technology, Photomasks

Proceedings Article | 23 March 2018 Presentation + Paper
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Extreme ultraviolet, Optical lithography, Etching, Tin, Resistance, Metals, Semiconducting wafers, Critical dimension metrology, Photomasks, Copper

Proceedings Article | 21 March 2018 Presentation + Paper
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Etching, Tin, SRAF, Optical lithography, Logic, Extreme ultraviolet, Photomasks, Stochastic processes, Scanning electron microscopy, Photoresist processing

Proceedings Article | 20 March 2018 Presentation + Paper
Proc. SPIE. 10588, Design-Process-Technology Co-optimization for Manufacturability XII
KEYWORDS: Optical lithography, Extreme ultraviolet, Metals, Logic, Manufacturing, Lithography, Back end of line, Extreme ultraviolet lithography, New and emerging technologies

Proceedings Article | 16 October 2017 Presentation
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Photomasks, Extreme ultraviolet, Optical lithography, Logic, Optical proximity correction, SRAF, Data conversion, Metals, Manufacturing, Semiconducting wafers

Showing 5 of 64 publications
Course Instructor
SC779: Polarization for Lithographers
The advent of ultra high numerical aperture (NA) systems enabled by immersion lithography has quickly brought polarization toward the top of the lithographer's list of concerns. A high index liquid between the resist and the last lens element allows better resolution by enabling larger angles of incidence, and thus more diffraction energy to couple into the resist. However various polarizing effects can become severe with these large angles of incidence. Most notably contrast from the TM component drops to near or below zero. Thus, the engineering of polarization states is becoming a necessary resolution enhancement technique. Consequently, understanding and controlling polarization throughout all components of the optical system become critical. This course provides the lithographer a basic knowledge of polarization and its application to high-NA imaging. After an introduction to the concept of polarization and the various ways it can be represented, both the benefits and limitations of its application to lithography are discussed. The polarizing effects of each component of the optical system are addressed, offering an understanding of their ultimate impact on imaging.
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