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Gregory Roche
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Publications (1)
Proceedings Article | 5 April 2007 Paper
Thermal imaging of a lithography cell, including exposure tool, using a self-contained instrumented wafer
Zach Reid, Mark Wiltse, Sandy Burgan, Gregory Roche
Proceedings Volume 6518, 65183S (2007) https://doi.org/10.1117/12.714231
KEYWORDS: Semiconducting wafers, Lithography, Sensors, Temperature metrology, Photoresist materials, Thermography, Wafer testing, Photoresist developing, Photoresist processing, Critical dimension metrology
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