Dr. Guangqing Chen Profile

Dr. Guangqing Chen

at ASML

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Author

Publications (5)

Proceedings Article | 17 April 2014 Paper

Across scanner platform optimization to enable EUV lithography at the 10-nm logic node

Jan Mulkens, Jaap Karssenberg, Hannah Wei, Marcel Beckers, Leon Verstappen, Stephen Hsu, Guangqin Chen

Proceedings Volume 9048, 90481L (2014) https://doi.org/10.1117/12.2048314

KEYWORDS: Scanners, Semiconducting wafers, Extreme ultraviolet lithography, Overlay metrology, Extreme ultraviolet, Optical lithography, Source mask optimization, Lithography, Logic, Actuators

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Proceedings Article | 23 September 2009 Paper

Defect printability analysis by lithographic simulation from high resolution mask images

George Chen, James Wiley, Jen-Shiang Wang, Rafael Howell, Shufeng Bai, Yi-Fan Chen, Frank Chen, Yu Cao, Tadahiro Takigawa, Yasuko Saito, Terunobu Kurosawa, Hideo Tsuchiya, Kinya Usuda, Masakazu Tokita, Fumio Ozaki, Nobutaka Kikuiri, Yoshitake Tsuji

Proceedings Volume 7488, 74880A (2009) https://doi.org/10.1117/12.831475

KEYWORDS: Photomasks, Inspection, Semiconducting wafers, Lithography, Scanners, Sensors, Image resolution, Optical inspection, Wafer-level optics, Printing

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Proceedings Article | 19 May 2008 Paper

Model-based mask verification on critical 45nm logic masks

F. Sundermann, F. Foussadier, T. Takigawa, J. Wiley, A. Vacca, L. Depre, G. Chen, S. Bai, J.-S. Wang, R. Howell, V. Arnoux, K. Hayano, S. Narukawa, S. Kawashima, H. Mohri, N. Hayashi, H. Miyashita, Y. Trouiller, F. Robert, F. Vautrin, G. Kerrien, J. Planchot, C. Martinelli, J. L. Di-Maria, V. Farys, B. Vandewalle, L. Perraud, J. C. Le Denmat, A. Villaret, C. Gardin, E. Yesilada, M. Saied

Proceedings Volume 7028, 70280U (2008) https://doi.org/10.1117/12.793037

KEYWORDS: Photomasks, Semiconducting wafers, Bridges, Scanning electron microscopy, Critical dimension metrology, Process modeling, Optical proximity correction, Reticles, Model-based design, Logic

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Proceedings Article | 19 May 2008 Paper

Model based short range mask process correction

G. Chen, J.-S. Wang, S. Bai, R. Howell, J. Wiley, A. Vacca, T. Kurosawa, T. Nishibe, T. Takigawa

Proceedings Volume 7028, 70280G (2008) https://doi.org/10.1117/12.793024

KEYWORDS: Photomasks, Process modeling, Optical proximity correction, Calibration, Scanning electron microscopy, Head, Manufacturing, Cadmium, Sensors, Error analysis

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Proceedings Article | 26 March 2007 Paper

Fast and accurate 3D mask model for full-chip OPC and verification

Peng Liu, Yu Cao, Luoqi Chen, Guangqing Chen, Mu Feng, Jiong Jiang, Hua-yu Liu, Sungsoo Suh, Sung-Woo Lee, Sukjoo Lee

Proceedings Volume 6520, 65200R (2007) https://doi.org/10.1117/12.712171

KEYWORDS: 3D modeling, Photomasks, Data modeling, Optical proximity correction, Calibration, Binary data, Semiconducting wafers, Performance modeling, Systems modeling, Fourier transforms

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