Dr. Guangqing Chen
at ASML Silicon Valley
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 17 April 2014 Paper
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Scanners, Semiconducting wafers, Extreme ultraviolet lithography, Overlay metrology, Extreme ultraviolet, Optical lithography, Source mask optimization, Lithography, Logic, Actuators

Proceedings Article | 23 September 2009 Paper
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Photomasks, Inspection, Semiconducting wafers, Lithography, Scanners, Sensors, Image resolution, Optical inspection, Wafer-level optics, Printing

Proceedings Article | 19 May 2008 Paper
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Photomasks, Process modeling, Optical proximity correction, Calibration, Scanning electron microscopy, Head, Manufacturing, Cadmium, Sensors, Error analysis

Proceedings Article | 19 May 2008 Paper
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Photomasks, Semiconducting wafers, Bridges, Scanning electron microscopy, Critical dimension metrology, Process modeling, Optical proximity correction, Reticles, Model-based design, Logic

Proceedings Article | 26 March 2007 Paper
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: 3D modeling, Photomasks, Data modeling, Optical proximity correction, Calibration, Binary data, Semiconducting wafers, Performance modeling, Systems modeling, Fourier transforms

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