Dr. Guido Schiffelers
Principal Architect at ASML Netherlands BV
SPIE Involvement:
Author
Publications (20)

Proceedings Article | 23 March 2020 Paper
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Extreme ultraviolet, Deep ultraviolet, Extreme ultraviolet lithography, Reflectivity, Reticles, Imaging systems, Scanners

Proceedings Article | 26 September 2019 Presentation + Paper
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Diffraction, Extreme ultraviolet lithography, Metals, Photomasks, Semiconducting wafers, Nanoimprint lithography, Optical proximity correction, Extreme ultraviolet, Phase modulation, Phase shift keying

Proceedings Article | 26 March 2019 Presentation + Paper
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Photomasks, Line width roughness, Semiconducting wafers, Metrology, Stochastic processes, Scanning electron microscopy, Critical dimension metrology, Data modeling, Linear filtering, Extreme ultraviolet lithography

Proceedings Article | 26 March 2019 Presentation + Paper
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Critical dimension metrology, Etching, Metrology, Lithography, Semiconducting wafers, Photoresist processing, Statistical analysis, Optical lithography, Stochastic processes

Proceedings Article | 26 March 2019 Presentation + Paper
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Etching, Lithography, Extreme ultraviolet lithography, Photoresist materials, Logic, Optical lithography

Showing 5 of 20 publications
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