Dr. Guido Schriever
at MPI für Dynamik und Selbstorganisation
SPIE Involvement:
Author
Publications (26)

SPIE Journal Paper | 29 May 2012
JM3 Vol. 11 Issue 02
KEYWORDS: Tin, Plasma, Extreme ultraviolet, Gas lasers, Extreme ultraviolet lithography, Photons, Mirrors, Light sources, Pulsed laser operation, Carbon monoxide

Proceedings Article | 20 March 2010 Paper
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Extreme ultraviolet, Tin, Scanners, Extreme ultraviolet lithography, Plasma, Ultraviolet radiation, Reliability, Semiconducting wafers, Lithography, Electrodes

Proceedings Article | 18 March 2009 Paper
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Mirrors, Extreme ultraviolet, Reflectivity, Ruthenium, Extreme ultraviolet lithography, Optics manufacturing, EUV optics, Optical design, Integrated optics, Solids

Proceedings Article | 18 March 2009 Paper
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Xenon, Plasma, Tin, Integrated optics, Scanners, Curtains, Electrodes, Reliability

Proceedings Article | 4 December 2008 Paper
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Scanners, Tin, Plasma, Xenon, Energy efficiency, Electrodes, Capacitors, Prototyping

Showing 5 of 26 publications
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