Mr. Guogui Deng Profile

Guogui Deng

at Semiconductor Manufacturing International Corp

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Author

Publications (3)

Proceedings Article | 8 March 2016 Paper

Study on overlay AEI-ADI shift on contact layer of advanced technology node

Guogui Deng, Jingan Hao, Lihong Xiao, Bin Xing, Yuntao Jiang, Kaiting He, Qiang Zhang, Weiming He, Chang Liu, Yi-Shih Lin, Qiang Wu, Xuelong Shi

Proceedings Volume 9778, 97782C (2016) https://doi.org/10.1117/12.2220013

KEYWORDS: Overlay metrology, Process control, Etching, Chemical vapor deposition, Semiconductors, Integrated circuits, Critical dimension metrology, Stress analysis, Semiconducting wafers, Photoresist materials, Lithography, Oxides, Optical lithography

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Proceedings Article | 19 March 2015 Paper

Study on ADI CD bias correlating ABC function

Guogui Deng, Jingan Hao, Bin Xing, Yuntao Jiang, Gaorong Li, Qiang Zhang, Liwan Yue, Yanlei Zu, Huayong Hu, Chang Liu, Manhua Shen, Shijian Zhang, Weiming He, Nannan Zhang, Yi-Shih Lin, Qiang Wu, Xuelong Shi

Proceedings Volume 9424, 94242I (2015) https://doi.org/10.1117/12.2086093

KEYWORDS: Critical dimension metrology, Scanning electron microscopy, Electron beams, Metals, Optical proximity correction, Inspection, Process control, Electron microscopes, Semiconductors, Control systems

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Proceedings Article | 31 March 2014 Paper

Study on abnormal intra-field CD uniformity induced by Efese-tilt application upon complex leveling scheme

Guogui Deng, Jingan Hao, Boxiu Cai, Bin Xing, Xin Yao, Qiang Zhang, Tianhui Li, Yi-Shih Lin, Qiang Wu, Xuelong Shi

Proceedings Volume 9052, 905229 (2014) https://doi.org/10.1117/12.2046308

KEYWORDS: Semiconducting wafers, Critical dimension metrology, Chlorine, Photomasks, Laser sources, Safety, Image processing, Fermium, Frequency modulation, Semiconductor manufacturing

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