Dr. Guohan Gao Profile

Dr. Guohan Gao

at Institute of Optics and Electronics, CAS

SPIE Involvement:

Author

Publications (1)

This will count as one of your downloads.

You will have access to both the presentation and article (if available).

DOWNLOAD NOW

This content is available for download via your institution's subscription. To access this item, please sign in to your personal account.

Email or Username Forgot your username?

Password Forgot your password?

Show

Keep me signed in

No SPIE account? Create an account

Proceedings Article | 5 November 2020 Paper

Reactive ion figuring of large optical membrane components

Zhiwei Li, Junming Shao, Qian Luo, Bin Fan, Baiping Lei, Guohan Gao, Jiang Bian, Shibin Wu, Junfeng Du

Proceedings Volume 11568, 115680Z (2020) https://doi.org/10.1117/12.2579498

KEYWORDS: Photomasks, Photoresist materials, Ions, Surface roughness, Reactive ion etching, Phase measurement, Optical lithography, Optical fabrication

Read Abstract +

A simpler and lower cost Reactive Ion Figuring (RIF) process was demonstrated, combining with flexible film photomasks and an algorithm of masking layers distribution for less iteration. As a novel alternative figuring technology, RIF with parallel removal mode and chemical removal mechanism has showed the actual potential for large segment class figuring, especially in mass production of lightweight optical membrane components. Although diffractive membrane optics has been expected to meet the requirement of large aperture space-based telescopes, the flexible membrane has so different properties from traditional materials that the desired geometrical form is hardly obtained by current ultra-precision surface manufacturing technologies. In this paper, a 300 mm aperture polyimide membrane substrate was figure-corrected by RIF from the initial figure error of 62 nm rms to the final figure error of ~20 nm rms in total effective figuring time of ~4.3 minutes. Film photomask lowered the cost of photomask fabrication down to less than two hundredths of that of quartz photomask fabrication. All distributions of protected regions and removed regions, i.e., the patterns to be fabricated onto film photomasks, were obtained from the transmitted wave-front map just at the start of the entire RIF process. After 2 iterations, it took ~4.3 min to figure this sample and the 20 nm RMS is obtained with a RMS convergence ratio of 3.1.

My Library

You currently do not have any folders to save your paper to! Create a new folder below.

Folder Name

Folder Description

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks. You are receiving this notice because your organization may not have SPIE eBooks access.*

*Shibboleth/Open Athens users─please sign in to access your institution's subscriptions.

To obtain this item, you may purchase the complete book in print or electronic format on SPIE.org.

ORGANIZATIONAL
Sign in with credentials provided by your organization.

Organizational Username

Organizational Password

Show/Hide Password

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members:

Non-members: ADD TO CART

Keywords/Phrases

Search In:

Publication Years