Mr. Guojing Zhang Profile

Guojing Zhang

Leader of EUV Mask Pilot and Module Processes at Intel Corp

SPIE Involvement:

Author

Publications (42)

Proceedings Article | 23 March 2020 Paper

Paper

EUV mask infrastructure and actinic pattern mask inspection

Guojing Zhang, Ted Liang, Yoshihiro Tezuka, Marieke Jager, Kishore Chakravorty, Safak Sayan, Eric Frendberg, Srinath Satyanarayana, Firoz Ghadiali, Frank Abboud

Proceedings Volume 11323, 1132310 (2020) https://doi.org/10.1117/12.2554496

KEYWORDS: Photomasks, Inspection, Extreme ultraviolet, Pellicles, Extreme ultraviolet lithography, Defect detection, Optical inspection, Semiconducting wafers, Deep ultraviolet, EUV optics

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Proceedings Article | 18 March 2016 Open Access

Open Access

Paper

EUV progress toward HVM readiness

Britt Turkot, Steven Carson, Anna Lio, Ted Liang, Mark Phillips, Brian McCool, Eric Stenehjem, Tim Crimmins, Guojing Zhang, Sam Sivakumar

Proceedings Volume 9776, 977602 (2016) https://doi.org/10.1117/12.2225014

KEYWORDS: Extreme ultraviolet, Reticles, Pellicles, Photomasks, Semiconducting wafers, Extreme ultraviolet lithography, Scanners, Optical lithography, Inspection, Yield improvement

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Proceedings Article | 11 November 2015 Paper

Paper

EUV mask infrastructure readiness and gaps for TD and HVM

Ted Liang, John Magana, Guojing Zhang, Kishore Chakravorty, Eric Panning

Proceedings Volume 9635, 963509 (2015) https://doi.org/10.1117/12.2202724

KEYWORDS: Photomasks, Inspection, Extreme ultraviolet, Pellicles, Extreme ultraviolet lithography, Particles, Scanners, Semiconducting wafers, Deep ultraviolet, Defect inspection

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Proceedings Article | 16 March 2015 Paper

Paper

Understanding EUV mask blank surface roughness induced LWR and associated roughness requirement

Pei-Yang Yan, Guojing Zhang, Eric Gullikson, Ken Goldberg, Markus Benk

Proceedings Volume 9422, 94220J (2015) https://doi.org/10.1117/12.2087041

KEYWORDS: Surface roughness, Line width roughness, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Atomic force microscopy, Chromium, Semiconducting wafers, Image quality, Reflectivity

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Proceedings Article | 9 September 2013 Paper

Paper

Measurement of EUV absorber and resist CD using spectroscopic ellipsometer

Guojing Zhang, Kyung Lee, Malahat Tavassoli, Pei-yang Yan

Proceedings Volume 8880, 88800Q (2013) https://doi.org/10.1117/12.2027231

KEYWORDS: Critical dimension metrology, Extreme ultraviolet, Scanning electron microscopy, Scatterometry, Photomasks, Lithography, Spectroscopy, Metrology, Cadmium, Line edge roughness

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Proceedings Article | 23 March 2012 Paper

Paper

EUVL multilayer mask blank defect mitigation for defect-free EUVL mask fabrication

Yan Liu, Marilyn Kamna, Fabian Martinez, Robert Chen, Pei-Yang Yan, Guojing Zhang

Proceedings Volume 8322, 83220Z (2012) https://doi.org/10.1117/12.927018

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Scanning electron microscopy, Defect inspection, Electron beam lithography, Precision measurement, Silica, Optical alignment, Inspection, Atomic force microscopy

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Proceedings Article | 14 October 2011 Paper

Paper

Phase-shifting effect of thin-absorber EUV masks

Sang H. Lee, Naoya Hayashi, Taichi Ogase, Hiroyoshi Tanabe, Manish Chandhok, Tetsunori Murachi, Tsukasa Abe, Guojing Zhang, Seh-Jin Park

Proceedings Volume 8166, 816618 (2011) https://doi.org/10.1117/12.895149

KEYWORDS: Photomasks, Phase shifts, Extreme ultraviolet, Reflectivity, Phase shifting, Semiconducting wafers, Refractive index, Lithography, Binary data, Extreme ultraviolet lithography

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SPIE Journal Paper | 1 July 2011

Extreme ultraviolet-embedded phase-shift mask

Pei-yang Yan, Michael Leeson, Sang Lee, Guojing Zhang, Eric Gullikson, Farhad Salmassi

JM3, Vol. 10, Issue 03, 033011, (July 2011) https://doi.org/10.1117/12.10.1117/1.3616060

KEYWORDS: Extreme ultraviolet lithography, Photomasks, Extreme ultraviolet, Reflectivity, Tin, Binary data, Etching, Semiconducting wafers, Reflection, Signal attenuation

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Proceedings Article | 8 April 2011 Paper

Paper

EUVL dark-field exposure impact on CDs using thick and thin absorber masks

Hiroyoshi Tanabe, Todd Younkin, Manish Chandhok, Guojing Zhang, Steve Carson, John Magana, Michael Leeson, Sang Lee

Proceedings Volume 7969, 79691R (2011) https://doi.org/10.1117/12.879428

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Cadmium sulfide, Extreme ultraviolet, Line width roughness, Lithography, Reflection, Electroluminescence, Phase shifting, Semiconducting wafers

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Proceedings Article | 5 April 2011 Paper

Paper

EUVL alternating phase shift mask

Eric Gullikson, Yashesh Shroff, Manish Chandhok, Alan Myers, Guojing Zhang, Pei-Yang Yan, Farhad Salmassi

Proceedings Volume 7969, 79690G (2011) https://doi.org/10.1117/12.884790

KEYWORDS: Extreme ultraviolet lithography, Photomasks, Binary data, Etching, Semiconducting wafers, Line width roughness, Phase shifts, Optical lithography, Printing, Image resolution

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Proceedings Article | 11 May 2009 Paper

Paper

Improvement of EUVL mask blank inspection capability at Intel

Hal Kusunose, Andy Ma, Ted Liang, Kazunori Omata, Seh-Jin Park, Yuta Sato, Tomoya Tamura, Guojing Zhang

Proceedings Volume 7379, 73790I (2009) https://doi.org/10.1117/12.824259

KEYWORDS: Inspection, Quartz, Silica, Photomasks, Particles, Extreme ultraviolet lithography, Extreme ultraviolet, Defect detection, Surface roughness, Defect inspection

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Proceedings Article | 18 March 2009 Paper

Paper

Demonstration of full-field patterning of 32 nm test chips using EUVL

Manish Chandhok, Michael Leeson, Gilroy Vandentop, Steven Carson, Ted Liang, Ernisse Putna, Todd Younkin, Guojing Zhang, Tetsunori Murachi, James Clarke, Alan Myers

Proceedings Volume 7271, 727116 (2009) https://doi.org/10.1117/12.814436

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Inspection, Optical lithography, Extreme ultraviolet, Particles, Photoresist materials, Line width roughness, Reticles, Semiconducting wafers

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Proceedings Article | 18 March 2009 Paper

Paper

Compensation of overlay errors due to mask bending and non-flatness for EUV masks

Alan Stivers, Seh-Jin Park, Fabian Martinez, Gian Lorusso, Alan Myers, Guojing Zhang, Jan Hermans, Tod Laursen, Sanjay Goyal, Michael Leeson, Marilyn Kamna, Sanjay Govindjee, Eric Hendrickx, Manish Chandhok, Gerd Brandstetter, Steven Carson

Proceedings Volume 7271, 72710G (2009) https://doi.org/10.1117/12.814428

KEYWORDS: Extreme ultraviolet, Photomasks, Finite element methods, Reticles, Error analysis, Thin films, Photovoltaics, Data modeling, Distortion, Image registration

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Proceedings Article | 17 October 2008 Paper

Paper

Pattern placement correction due to bending in EUVL masks

Guojing Zhang, Fabian Martinez, Chuan Hu, Chandhok Manish, Alan Stivers, Nathan Wilcox, Marilyn Kamna, Kamgmin Hsia, Seh-Jin Park

Proceedings Volume 7122, 71222C (2008) https://doi.org/10.1117/12.801542

KEYWORDS: Extreme ultraviolet lithography, Photomasks, Metrology, Thin films, Personal protective equipment, Distortion, Image registration, Thin film deposition, Extreme ultraviolet, Reticles

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Proceedings Article | 29 May 2007 Paper

Paper

Progress on EUV mask fabrication for 32-nm technology node and beyond

Ping Qu, Pei-Yang Yan, Ted Liang, Barry Lieberman, Erdem Ultanir, Peter Sanchez, Alan Stivers, Sven Henrichs, Seh-jin Park, Emily Shu, Guojing Zhang, Gilroy Vandentop

Proceedings Volume 6607, 66070R (2007) https://doi.org/10.1117/12.728941

KEYWORDS: Extreme ultraviolet lithography, Photomasks, Inspection, Extreme ultraviolet, Multilayers, Reflectivity, Etching, Mask making, Metrology, Defect inspection

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Proceedings Article | 20 May 2006 Paper

Paper

EUV mask pattern defect printability

Seh-Jin Park, Alan Myers, Guojing Zhang, Alan Stivers, Patrick Naulleau, Gilroy Vandentop, Ted Liang

Proceedings Volume 6283, 62830K (2006) https://doi.org/10.1117/12.681844

KEYWORDS: Photomasks, Extreme ultraviolet, Inspection, Extreme ultraviolet lithography, Scanning electron microscopy, Printing, Cadmium, Photomicroscopy, Semiconducting wafers, Optical lithography

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Proceedings Article | 20 May 2006 Paper

Paper

TaN-based EUV mask absorber etch study

Ki-Ho Baik, Guojing Zhang, Seh-Jin Park, Yan Du, Chang Ju Choi, Pei-Yang Yan

Proceedings Volume 6283, 62833D (2006) https://doi.org/10.1117/12.681832

KEYWORDS: Etching, Chemistry, Photomasks, Ruthenium, Extreme ultraviolet, Reactive ion etching, Critical dimension metrology, Chlorine, Diffractive optical elements, Extreme ultraviolet lithography

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Proceedings Article | 20 May 2006 Paper

Paper

EUV mask process development and integration

Ted Liang, Chang Ju Choi, Alan Stivers, Kangmin Hsia, Eric Lanzendorf, Gilroy Vandentop, Michael Leeson, Seh-jin Park, Emily Shu, Peter Sanchez, Guojing Zhang, Manish Chandhok, Pei-Yang Yan, Yan Du, Jeff Farnsworth

Proceedings Volume 6283, 62830G (2006) https://doi.org/10.1117/12.681839

KEYWORDS: Photomasks, Extreme ultraviolet, Etching, Reflectivity, Defect inspection, Extreme ultraviolet lithography, Inspection, Ruthenium, Image processing, Optical lithography

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Proceedings Article | 10 May 2005 Paper

Paper

Understanding and reduction of defects on finished EUV masks

Guojing Zhang, Ted Liang, Peter Sanchez, Alan Stivers, Emily Shu, Rajesh Nagpal

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.604717

KEYWORDS: Photomasks, Inspection, Extreme ultraviolet, Deep ultraviolet, Scanning electron microscopy, Atomic force microscopy, Contamination, Defect inspection, Extreme ultraviolet lithography, EUV optics

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Proceedings Article | 6 May 2005 Paper

Paper

One small step: world's first integrated EUVL process line

Jeanette Roberts, Heidi Cao, Robert Bristol, Terence Bacuita, Guojing Zhang, Sang Lee, Bryan Rice, Manish Chandhok, Melissa Shell, Eric Panning

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.600259

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Photomasks, Semiconducting wafers, Reflectivity, Reticles, Mirrors, Light sources, Plasma, Mask making

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Proceedings Article | 6 December 2004 Paper

Paper

EUV mask pilot line at Intel Corporation

Emily Shu, Pei-Yang Yan, Alan Stivers, Ted Liang, Rajesh Nagpal, Edita Tejnil, Barry Lieberman, Fu-Chang Lo, Guojing Zhang, Michael Penn, Kangmin Hsia

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569176

KEYWORDS: Photomasks, Extreme ultraviolet, Inspection, Extreme ultraviolet lithography, Reflectivity, Metrology, Lithography, Optical lithography, Standards development, Mask making

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Proceedings Article | 6 December 2004 Paper

Paper

EUVL mask patterning with blanks from commercial suppliers

Rajesh Nagpal, Pei-Yang Yan, Chaoyang Li, Emily Shu, Frederick Chen, Guojing Zhang, Ping Qu

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569329

KEYWORDS: Extreme ultraviolet lithography, Reflectivity, Photomasks, Optical lithography, Ruthenium, Etching, Inspection, Chromium, Coating, Scanning electron microscopy

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Proceedings Article | 20 August 2004 Paper

Paper

Ru-capped EUVL ML mask blank performance

Eberhard Spiller, Guojing Zhang, Paul Mirkarimi, Pei-Yang Yan

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557816

KEYWORDS: Ruthenium, Reflectivity, Photomasks, Etching, Extreme ultraviolet lithography, Silicon, Optical lithography, Surface roughness, Oxides, Oxidation

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Proceedings Article | 20 May 2004 Paper

Paper

Comparison of techniques to measure the point spread function due to scatter and flare in EUV lithography systems

Alan Stivers, Melissa Shell, Eric Panning, Michael Goldstein, Christof Krautschik, Bryan Rice, Sang Lee, Guojing Zhang, Robert Bristol, Manish Chandhok

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.535995

KEYWORDS: Point spread functions, Modulation transfer functions, Mirrors, Extreme ultraviolet lithography, Critical dimension metrology, Spatial frequencies, Extreme ultraviolet, Optical proximity correction, Fourier transforms, Deep ultraviolet

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Proceedings Article | 17 December 2003 Paper

Paper

EUVL mask with Ru ML capping

Guojing Zhang, Paul Mirkarimi, Scott Chegwidden, Eberhard Spiller, Pei-Yang Yan

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.520024

KEYWORDS: Ruthenium, Etching, Reflectivity, Silicon, Photomasks, Extreme ultraviolet lithography, Optical lithography, Oxides, Extreme ultraviolet, Electron beam lithography

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Proceedings Article | 16 June 2003 Paper

Paper

Implementing flare compensation for EUV masks through localized mask CD resizing

Christof Krautschik, Bryan Rice, Sang Hun Lee, Guojing Zhang, Robert Bristol, Vivek Singh, Manish Chandhok, Michael Goldstein, Eric Panning

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.482344

KEYWORDS: Photomasks, Critical dimension metrology, Point spread functions, Chromium, Cadmium, Optical proximity correction, Extreme ultraviolet, Extreme ultraviolet lithography, Convolution, Mirrors

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Proceedings Article | 16 June 2003 Paper

Paper

Static EUV micro-exposures using the ETS Set-2 optics

Keith Jackson, Sherry Baker, Christopher Walton, Bruce Harteneck, Eberhard Spiller, Pei-Yang Yan, Farhad Salmassi, Jeffrey Bokor, Donna O'Connell, Deirdre Olynick, Erik Anderson, Paul Mirkarimi, Patrick Naulleau, Kenneth Goldberg, Guojing Zhang

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.490129

KEYWORDS: Lithography, Extreme ultraviolet, Printing, Photomasks, EUV optics, Wafer-level optics, Semiconducting wafers, Extreme ultraviolet lithography, Mirrors, Fiber optic illuminators

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Proceedings Article | 27 December 2002 Paper

Paper

Cr and TaN absorber mask etch CD performance study for extreme-ultraviolet lithography

Guojing Zhang, Pei-yang Yan

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468213

KEYWORDS: Etching, Chromium, Extreme ultraviolet lithography, Photomasks, Critical dimension metrology, Semiconducting wafers, Silicon, Extreme ultraviolet, Plasma etching, Scanning electron microscopy

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Proceedings Article | 1 July 2002 Paper

Paper

Lithographic evaluation of the EUV engineering test stand

Donna O'Connell, Steven Haney, Alvin Leung, David Attwood, Donald Sweeney, William Replogle, Henry Chapman, Daniel Tichenor, Eric Panning, John Goldsmith, Kenneth Goldberg, Charles Gwyn, Patrick Naulleau, Pei-yang Yan, Stefan Wurm, Glenn Kubiak, Guojing Zhang, Sang Hun Lee, Kenneth Blaedel, Karen Jefferson, Eric Gullikson, William Ballard, John Bjorkholm, Luis Bernardez, John Wronosky, Terry Johnson

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472300

KEYWORDS: Extreme ultraviolet, Lithography, Projection systems, Semiconducting wafers, Extreme ultraviolet lithography, Photomasks, Reticles, Printing, Point spread functions, Image resolution

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Proceedings Article | 1 July 2002 Paper

Paper

Static microfield printing at the advanced light source with the ETS Set-2 optic

Eric Gullikson, Regina Soufli, Henry Chapman, Guojing Zhang, Charles Gwyn, Brian Hoef, Pei-yang Yan, Donald Sweeney, Phillip Batson, Deirdre Olynick, John Taylor, Daniel Tichenor, Paul Denham, Kenneth Blaedel, Farhad Salmassi, Jeffrey Bokor, Kenneth Goldberg, Richard Stulen, Bruce Harteneck, David Attwood, Senajith Rekawa, Layton Hale, Patrick Naulleau, Avijit Ray-Chaudhuri, Eberhard Spiller, Keith Jackson, Erik Anderson, Donna O'Connell, Christopher Walton

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472318

KEYWORDS: Printing, Extreme ultraviolet, Lithography, Fiber optic illuminators, Interferometry, Mirrors, Reticles, Modulation transfer functions, Wavefronts, Critical dimension metrology

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Proceedings Article | 11 March 2002 Paper

Paper

Enhanced optical inspectability of patterned EUVL mask

Guojing Zhang, Ted Liang, Edita Tejnil, Alan Stivers, Pei-yang Yan

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458303

KEYWORDS: Inspection, Reflectivity, Extreme ultraviolet lithography, Photomasks, Deep ultraviolet, Chromium, Image transmission, Optical inspection, Image enhancement, Ruthenium

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Proceedings Article | 20 August 2001 Paper

Paper

TaN EUVL mask fabrication and characterization

Andy Ma, Guojing Zhang, Pei-yang Yan, Ted Liang

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436668

KEYWORDS: Photomasks, Etching, Extreme ultraviolet, Metals, Reflectivity, Extreme ultraviolet lithography, Optical lithography, Chromium, Tin, Oxides

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Proceedings Article | 22 January 2001 Paper

Paper

Cr absorber mask for extreme-ultraviolet lithography

Pei-yang Yan, Ted Liang, Guojing Zhang

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410675

KEYWORDS: Chromium, Photomasks, Etching, Reflectivity, Extreme ultraviolet, Extreme ultraviolet lithography, Multilayers, Inspection, Silicon, Semiconducting wafers

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Proceedings Article | 21 July 2000 Paper

Paper

EUVL printing results of a low-thermal expansion material (LTEM) mask

Patrick Kearney, Cindy Larson, John Taylor, Donna O'Connell, Guojing Zhang, James Wasson, Christopher Walton, Daniel Folk, Pawitter Mangat, Scott Hector, Melissa Shell, William Tong

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390038

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Semiconducting wafers, Silicon, Manufacturing, Printing, Distortion, Lithography, Extreme ultraviolet, Reflectivity

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Proceedings Article | 19 July 2000 Paper

Paper

EUV mask absorber characterization and selection

Pei-yang Yan, Alan Stivers, Guojing Zhang, Jeffrey Powers, Patrick Kofron, Mark Tran, Ted Liang, Fu-Chang Lo

Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392025

KEYWORDS: Etching, Metals, Photomasks, Oxides, Inspection, Extreme ultraviolet lithography, Extreme ultraviolet, Reflectivity, Tantalum, Chromium

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Proceedings Article | 30 December 1999 Paper

Paper

Experimental study of mask line edge roughness transfer in DUV and EUV lithography patterning process

Pei-yang Yan, Guojing Zhang

Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373302

KEYWORDS: Line edge roughness, Photomasks, Extreme ultraviolet, Semiconducting wafers, Wafer-level optics, Deep ultraviolet, Extreme ultraviolet lithography, EUV optics, Critical dimension metrology, Lithography

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Proceedings Article | 30 December 1999 Paper

Paper

Comparison of at-wavelenth inspection, printability, and simulation of nanometer-scale substrate defects in extreme ultraviolet lithography (EUVL)

Scott Hector, David Mancini, Bill Wilkinson, Christopher Walton, Avijit Ray-Chaudhuri, Guojing Zhang, Gregory Cardinale, Charles Cerjan, Zorian Masnyj, Jeffrey Bokor, Pei-yang Yan, Seongtae Jeong, Aaron Fisher, John Goldsmith, Pawitter Mangat, Scott Burkhart, Cindy Larson

Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373339

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Extreme ultraviolet, Multilayers, Inspection, Chromium, Scanning electron microscopy, Reticles, Silicon films, Printing

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Proceedings Article | 25 June 1999 Paper

Paper

EUV mask patterning approaches

Patrick Kearney, Alan Stivers, Pei-yang Yan, Jenn Chow, Guojing Zhang, Gregory Cardinale, Patrick Kofron, Edita Tejnil

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351102

KEYWORDS: Photomasks, Extreme ultraviolet, Silicon, Metals, Extreme ultraviolet lithography, Optical lithography, Mask making, Reflectivity, Etching, Opacity

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Proceedings Article | 18 December 1998 Paper

Paper

EUV mask absorber defect repair with focused ion beam

Patrick Kearney, John Richards, Patrick Kofron, Souping Yan, Jenn Chow, Guojing Zhang, Pei-yang Yan

Proceedings Volume 3546, (1998) https://doi.org/10.1117/12.332828

KEYWORDS: Oxides, Gallium, Extreme ultraviolet, Opacity, Metals, Etching, Photomasks, Reflectivity, Contamination, Ion beams

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Proceedings Article | 29 June 1998 Paper

Paper

Progress in 193-nm top-surface imaging process development

Janet Chambers, Adam Pawloski, Guojing Zhang, Siddhartha Das, Veena Rao, Carlos Fonseca, John Hutchinson, Craig Henderson, Susan Holl, David Wheeler

Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312405

KEYWORDS: Line edge roughness, Etching, Photoresist processing, Chemically amplified resists, Chemistry, Plasma etching, Silicon, Image processing, Plasma, Optical lithography

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Proceedings Article | 5 June 1998 Paper

Paper

EUV mask absorber defect size requirement at 100-nm design rules

Patrick Kofron, Guojing Zhang, Harun Solak, Jenn Chow, Gregory Cardinale, Craig Henderson, Joseph Langston, Pei-yang Yan, Patrick Kearney, Kurt Berger

Proceedings Volume 3331, (1998) https://doi.org/10.1117/12.309627

KEYWORDS: Photomasks, Critical dimension metrology, Opacity, Semiconducting wafers, Process control, Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist processing, Scanning electron microscopy, Metals

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Proceedings Article | 16 May 1994 Paper

Paper

Liquid phase silylation process for 248 nm lithography using EL IR photoresist

Bruce Smith, Guojing Zhang, Lynn Fuller

Proceedings Volume 2195, (1994) https://doi.org/10.1117/12.175365

KEYWORDS: Liquids, Electroluminescence, Photoresist materials, Etching, Photoresist processing, Lithography, Silicon, Deep ultraviolet, Semiconducting wafers, Plasma

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Showing 5 of 42 publications

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