Guojing Zhang
Manager of Advanced Mask Technology at Intel Corp
SPIE Involvement:
Author
Publications (42)

Proceedings Article | 23 March 2020 Paper
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Photomasks, Inspection, Extreme ultraviolet, Pellicles, Extreme ultraviolet lithography, Defect detection, Optical inspection, Semiconducting wafers, Deep ultraviolet, EUV optics

Proceedings Article | 18 March 2016 Paper
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Extreme ultraviolet, Reticles, Pellicles, Photomasks, Semiconducting wafers, Extreme ultraviolet lithography, Scanners, Optical lithography, Inspection, Yield improvement

Proceedings Article | 11 November 2015 Paper
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Photomasks, Inspection, Extreme ultraviolet, Pellicles, Extreme ultraviolet lithography, Particles, Scanners, Semiconducting wafers, Deep ultraviolet, Defect inspection

Proceedings Article | 16 March 2015 Paper
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Surface roughness, Line width roughness, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Atomic force microscopy, Chromium, Semiconducting wafers, Image quality, Reflectivity

Proceedings Article | 9 September 2013 Paper
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Critical dimension metrology, Extreme ultraviolet, Scanning electron microscopy, Scatterometry, Photomasks, Lithography, Spectroscopy, Metrology, Cadmium, Line edge roughness

Showing 5 of 42 publications
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