Dr. Guy A. DeRose Profile

Dr. Guy A. DeRose

Assoc Dir of Tech Operations KNI at California Institute of Technology

SPIE Involvement:

Author

Publications (6)

Proceedings Article | 1 May 2023 Presentation + Paper

Enhancing the sensitivity of a high resolution negative-tone metal organic photoresist for extreme ultra violet lithography

Michaela Vockenhuber, Scott Lewis, Hayden Alty, Guy DeRose, Dimitrios Kazazis, Grigore Timco, James Mann, Paul Winpenny, Axel Scherer, Yasin Ekinci, Richard Winpenny

Proceedings Volume 12498, 124980X (2023) https://doi.org/10.1117/12.2658324

KEYWORDS: Electron beam lithography, Electron beams, Etching, Dry etching, Molecules, Silicon, Mercury, Monte Carlo methods, Extreme ultraviolet lithography

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SPIE Journal Paper | 2 June 2022

Sensitivity enhancement of a high-resolution negative-tone nonchemically amplified metal organic photoresist for extreme ultraviolet lithography

Scott Lewis, Hayden Alty, Michaela Vockenhuber, Guy DeRose, Antonio Fernandez Mato, Dimitrios Kazazis, Paul Winpenny, Richard Grindell, Grigore Timco, Axel Scherer, Yasin Ekinci, Richard E. Winpenny

JM3, Vol. 21, Issue 04, 041404, (June 2022) https://doi.org/10.1117/12.10.1117/1.JMM.21.4.041404

KEYWORDS: Extreme ultraviolet lithography, Selenium, Electron beam lithography, Monte Carlo methods, Metals, Mercury, Molecules, Chemical species, Photomicroscopy, Absorption

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Proceedings Article | 3 October 2018 Paper

Design and implementation of the next generation electron beam resists for the production of EUVL photomasks

Scott Lewis, Guy DeRose, Matthew Hunt, Axel Scherer, Stephen Yeates, Richard Winpenny, Hayden Alty, Alex Werthiem, Jarvis Li, Trevor Fowler, Sang Kook Lee, Christopher Muryn, Grigore Timco

Proceedings Volume 10810, 108100N (2018) https://doi.org/10.1117/12.2501808

KEYWORDS: Nanostructures, Electron beam lithography, Scattering, Etching, Molecules, Silicon, Chromium, Monte Carlo methods, Photomasks, Extreme ultraviolet lithography

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Proceedings Article | 19 January 2005 Paper

Lithographic nanofabrication of optical cavities

Mark Adams, Axel Scherer, Michael Hochberg, Guy DeRose, Marko Loncar

Proceedings Volume 5592, (2005) https://doi.org/10.1117/12.571540

KEYWORDS: Lithography, Refractive index, Quantum wells, Sensors, Spectroscopy, Photonic crystals, Laser resonators, Optical resonators, Chemical analysis, Nanofabrication

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Proceedings Article | 1 June 2004 Paper

Annular Bragg defect mode resonators

Amnon Yariv, William Green, Guy DeRose, Jacob Scheuer

Proceedings Volume 5333, (2004) https://doi.org/10.1117/12.544590

KEYWORDS: Semiconductors, Reflectors, Refractive index, Quantum wells, Resonators, Luminescence, Optical pumping, Reactive ion etching, Bessel functions, Environmental sensing

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Proceedings Article | 10 June 2002 Paper

Fundamental approach for optoelectronic and microfluidic integration for miniaturizing spectroscopic devices

Stephen Quake, Guy DeRose, Mark Adams, Axel Scherer

Proceedings Volume 4647, (2002) https://doi.org/10.1117/12.469818

KEYWORDS: Visible radiation, Light sources, Microfluidics, Imaging systems, Sensors, Silicon, Optoelectronics, Optoelectronic devices, Spectroscopes, Absorption

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Showing 5 of 6 publications

Conference Committee Involvement (1)

Nanofabrication: Technologies, Devices, and Applications II

23 October 2005 | Boston, MA, United States

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