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Hagay Duenias
Lithography Engineer at Micron Israel
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Publications (1)
Proceedings Article | 12 May 2005 Paper
Prediction of the lens lifetime by monitoring lens degradation on laser-based microlithography tools
Albert Michaeli, Eylon Rosner, Yehuda Root, Hagay Duenias, Shai Rubin
Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.613278
KEYWORDS: Contamination, Absorption, Semiconducting wafers, Adsorption, Photomasks, Lithography, Pulsed laser operation, Image quality, Optical lithography, Software development
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