Dr. Hagen Bartzsch Profile

Dr. Hagen Bartzsch

at Fraunhofer-FEP

SPIE Involvement:

Author

Publications (8)

Proceedings Article | 11 May 2017 Paper

Large area precision optical coatings by pulse magnetron sputtering

Peter Frach, Daniel Gloess, Thomas Goschurny, Andy Drescher, Ullrich Hartung, Hagen Bartzsch, Andreas Heisig, Harald Grune, Lothar Leischnig, Steffen Leischnig, Carsten Bundesmann

Proceedings Volume 10181, 101810K (2017) https://doi.org/10.1117/12.2262541

KEYWORDS: Coating, Optical coatings, Sputter deposition, Optical filters, Antireflective coatings, Refractive index, Glasses, Niobium, Coating equipment, Holography

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Proceedings Article | 8 May 2017 Paper

Energy harvesting based on piezoelectric AlN and AlScN thin films deposited by high rate sputtering

Peter Frach, Stephan Barth, Hagen Bartzsch, Daniel Gloess

Proceedings Volume 10194, 101942Z (2017) https://doi.org/10.1117/12.2262460

KEYWORDS: Aluminum nitride, Energy harvesting, Scandium, Aluminum, Thin films, Sputter deposition, Metals, Silicon, Switches, Thin film deposition

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Aluminum nitride (AlN) is a piezoelectric material often used as thin film in SAW/BAW devices. Furthermore, there is an increasing interest in its use for energy harvesting applications. Despite it has a relatively low piezoelectric coefficient, it is a suitable choice for energy harvesting applications and due to its low dielectric constant and good mechanical properties. In addition, it is a lead-free material. The films were deposited by reactive pulsed magnetron sputtering using the Double Ring Magnetron DRM 400. This sputter source together with suitable powering and process control allows depositing piezoelectric AlN very homogeneously on 8” substrates with deposition rates of up to 200 nm/min. With the developed technology, film thicknesses of several ten microns are technically and economically feasible. Moreover, by adjusting process parameters accordingly, it is possible to tune properties, like film stress, to application specific requirements. Additionally, it is known that the doping of AlN with Scandium results in a significantly increased piezoelectric coefficient. The influence of process parameters and Sc concentration on film properties were determined by piezometer, pulse echo, SEM, XRD, EDS and nanoindentation measurements. Energy harvesting measurements were done using an electromechanical shaker system for the excitation of defined vibrations and a laservibrometer for determination of the displacement of the samples. The generated power was measured as function of electric load at resonance. An rms power of up to 140μW using AlN films and of 350μW using AlScN films was generated on Si test pieces of 8x80mm². Furthermore, energy harvesting measurements using manually bended steel strips of 75x25mm² coated with AlScN were carried out as well. When using only a single actuation, energy of up to 8μJ could be measured. By letting the system vibrate freely, the damped vibration at resonance 50Hz resulted in a measured energy of 420μJ.

Proceedings Article | 21 May 2015 Paper

Influence of process parameters on properties of piezoelectric AlN and AlScN thin films for sensor and energy harvesting applications

Stephan Barth, Hagen Bartzsch, Daniel Gloess, Peter Frach, Thomas Modes, Olaf Zywitzki, Gunnar Suchaneck, Gerald Gerlach

Proceedings Volume 9517, 951704 (2015) https://doi.org/10.1117/12.2179468

KEYWORDS: Aluminum nitride, Scandium, Energy harvesting, Thin films, Sputter deposition, Plasma, Aluminum, Doping, Sensors, Ferroelectric materials

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Proceedings Article | 5 May 2011 Paper

Smart ultrasonic sensors systems: investigations on aluminum nitride thin films for the excitation of high frequency ultrasound

Susan Walter, Thomas Herzog, Henning Heuer, Hagen Bartzsch, Daniel Gloess

Proceedings Volume 8066, 806607 (2011) https://doi.org/10.1117/12.886852

KEYWORDS: Sensors, Aluminum nitride, Electrodes, Thin films, Ultrasonography, Sputter deposition, Silicon, Ultrasonics, Phased arrays, Transducers

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Proceedings Article | 25 September 2008 Paper

Sputter process with time-variant reactive gas mixture for the deposition of optical multilayer and gradient layer systems

H. Bartzsch, J. Weber, K. Lau, D. Glöß, P. Frach

Proceedings Volume 7101, 71010J (2008) https://doi.org/10.1117/12.797693

KEYWORDS: Oxygen, Nitrogen, Oxides, Sputter deposition, Silicon, Reflection, Silica, Argon, Plasma, Multilayers

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Proceedings Article | 5 October 2005 Paper

Deposition of broadband antireflection coatings on plastic substrates by evaporation and reactive pulse magnetron sputtering

J. Weber, U. Schulz, N. Kaiser, H. Bartzsch, P. Frach

Proceedings Volume 5963, 596327 (2005) https://doi.org/10.1117/12.625361

KEYWORDS: Coating, Plasma, Sputter deposition, Antireflective coatings, Protactinium, Phase modulation, Climatology, Multilayers, Refractive index, Resistance

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Proceedings Article | 5 October 2005 Paper

Precision optical and antireflection multilayer and gradient coatings containing reactively sputtered oxides, nitrides and fluorides

H. Bartzsch, P. Frach, J. Weber, J.-S. Liebig

Proceedings Volume 5963, 59631B (2005) https://doi.org/10.1117/12.624633

KEYWORDS: Optical coatings, Absorption, Silicon, Multilayers, Aluminum, Antireflective coatings, Sputter deposition, Refractive index, Optical filters, Fluorine

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Proceedings Article | 25 February 2004 Paper

Silicon oxynitride rugate filters grown by reactive pulse magnetron sputtering

Hagen Bartzsch, Stephan Lange, Peter Frach, Klaus Goedicke

Proceedings Volume 5250, (2004) https://doi.org/10.1117/12.513332

KEYWORDS: Silicon, Refractive index, Optical coatings, Optical filters, Reflectivity, Sputter deposition, Antireflective coatings, Oxygen, Oxides, Coating

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Showing 5 of 8 publications

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