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Haihan Luo
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Publications (1)
Proceedings Article | 16 October 2012 Paper
Influence of substrate rotating on the microstructure and surface morphology of Ge and Si thin films
Proceedings Volume 8416, 84160V (2012) https://doi.org/10.1117/12.971477
KEYWORDS: Thin films, Germanium, Silicon, Silicon films, Thin film deposition, Scanning electron microscopy, Atomic force microscopy, X-ray diffraction, Deposition processes, Refractive index
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