Ms. Hajime Nakao Profile

Hajime Nakao

Researcher at CASMAT

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Publications (1)

Proceedings Article | 29 March 2006 Paper

New chemical approach for resist poisoning problem in via first dual-damascene process

Hajime Nakao, Satoshi Takei, Tetsuya Shinjo, Yasuyuki Nakajima

Proceedings Volume 6153, 61532O (2006) https://doi.org/10.1117/12.655529

KEYWORDS: Contamination, Photoresist processing, Lithography, Chemical reactions, Annealing, Diffusion, Semiconducting wafers, Silicon, Cadmium sulfide, Polymers

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