Mr. Hajime Yamamoto Profile

Hajime Yamamoto

at Nikon Corp

SPIE Involvement:

Author

Publications (10)

Proceedings Article | 24 March 2017 Paper

On-product overlay improvement with an enhanced alignment system

Tomonori Dosho, Yuji Shiba, Takanobu Okamoto, Hajime Yamamoto, Yujiro Hikida, Jay Brown, Go Ichinose, Masahiro Morita, Yuichi Shibazaki

Proceedings Volume 10147, 1014716 (2017) https://doi.org/10.1117/12.2257659

KEYWORDS: Semiconducting wafers, Optical alignment, Lithography, Manufacturing, Chemical mechanical planarization, Precision measurement, Overlay metrology, Distortion, Optical parametric oscillators, Systems modeling, 3D modeling

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Proceedings Article | 31 March 2014 Paper

Imaging control functions of optical scanners

Hisashi Nishinaga, Toru Hirayama, Daiyu Fujii, Hajime Yamamoto, Hiroshi Irihama, Taro Ogata, Yukio Koizumi, Kenta Suzuki, Yohei Fujishima, Tomoyuki Matsuyama, Ryoichi Kawaguchi

Proceedings Volume 9052, 90520B (2014) https://doi.org/10.1117/12.2046640

KEYWORDS: Reticles, Distortion, Control systems, Ions, Sensors, Image sensors, Optical scanning, Printing, Immersion lithography, Lithography

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Proceedings Article | 31 March 2014 Paper

Scanner performance predictor and optimizer in further low-k1 lithography

Hajime Aoyama, Toshiharu Nakashima, Taro Ogata, Shintaro Kudo, Naonori Kita, Junji Ikeda, Ryota Matsui, Hajime Yamamoto, Ayako Sukegawa, Katsushi Makino, Masayuki Murayama, Kazuo Masaki, Tomoyuki Matsuyama

Proceedings Volume 9052, 90520A (2014) https://doi.org/10.1117/12.2046547

KEYWORDS: Reticles, Photomasks, Scanners, Critical dimension metrology, Semiconducting wafers, Lithography, Electroluminescence, Error analysis, Distortion, Data modeling

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Proceedings Article | 12 April 2013 Paper

Comprehensive thermal aberration and distortion control of lithographic lenses for accurate overlay

Yohei Fujishima, Satoshi Ishiyama, Susumu Isago, Akihiro Fukui, Hajime Yamamoto, Toru Hirayama, Tomoyuki Matsuyama, Yasuhiro Ohmura

Proceedings Volume 8683, 86831I (2013) https://doi.org/10.1117/12.2010908

KEYWORDS: Distortion, Reticles, Lithography, Switching, Water, Semiconducting wafers, Imaging systems, Deformable mirrors, Lithographic lenses, Immersion lithography

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Proceedings Article | 13 March 2012 Paper

High overlay accuracy for double patterning using an immersion scanner

Yuji Shiba, Katsushi Makino, Yasuhiro Morita, Chihaya Motoyoshi, Hajime Yamamoto, Jin Udagawa, Takahisa Kikuchi, Yosuke Shirata, Yuuki Ishii

Proceedings Volume 8326, 83260T (2012) https://doi.org/10.1117/12.916246

KEYWORDS: Double patterning technology, Optical alignment, Distortion, Semiconducting wafers, Overlay metrology, Reticles, Scanners, Cooling systems, Lithography, Semiconductor manufacturing

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Proceedings Article | 16 June 2003 Paper

Distortion management strategy for EPL reticle

Hajime Yamamoto, Takashi Aoyama, Noriyuki Hirayanagi, Kazuaki Suzuki

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.483743

KEYWORDS: Reticles, Distortion, Metrology, Semiconducting wafers, Sensors, Electron beam lithography, Data corrections, Photography, Manufacturing, Projection lithography

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Proceedings Article | 20 August 2001 Paper

Highly accurate CD control at stitching region for electron-beam projection lithography

Tomoharu Fujiwara, Takeshi Irita, Sumito Shimizu, Hajime Yamamoto, Kazuaki Suzuki

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436696

KEYWORDS: Reticles, Critical dimension metrology, Semiconducting wafers, Projection lithography, Electron beams, Electron beam lithography, Scattering, Optical simulations, Scanning electron microscopy, Laser scattering

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Proceedings Article | 20 August 2001 Paper

Nikon EB Stepper: the latest development status

Kazuaki Suzuki, Tomoharu Fujiwara, Kazunari Hada, Noriyuki Hirayanagi, Shintaro Kawata, Kenji Morita, Kazuya Okamoto, Teruaki Okino, Sumito Shimizu, Takehisa Yahiro, Hajime Yamamoto

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436632

KEYWORDS: Reticles, Semiconducting wafers, Electron beams, Silicon, Sensors, Optical alignment, Optical lithography, Photomasks, Wafer-level optics, Image sensors

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Proceedings Article | 20 August 2001 Paper

High-accuracy aerial image measurement for electron-beam projection lithography

Takehisa Yahiro, Noriyuki Hirayanagi, Kenji Morita, Takeshi Irita, Hajime Yamamoto, Shohei Suzuki, Hiroyasu Shimizu, Shintaro Kawata, Teruaki Okino, Kazuaki Suzuki

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436679

KEYWORDS: Image sensors, Signal detection, Calibration, Sensors, Signal to noise ratio, Silicon, Monochromatic aberrations, Electron beams, Projection lithography, Electron beam lithography

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Proceedings Article | 21 July 2000 Paper

Data of scattered electron characteristics in 100-kV EB stepper

Kenji Morita, Takehisa Yahiro, Sumito Shimizu, Hajime Yamamoto, Noriyuki Hirayanagi, Tomoharu Fujiwara, Syouhei Suzuki, Hiroyasu Shimizu, Shintaro Kawata, Teruaki Okino, Kazuaki Suzuki

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390111

KEYWORDS: Reticles, Scattering, Silicon, Semiconducting wafers, Laser scattering, Electron beams, Monte Carlo methods, Lithography, Calibration, Optical alignment

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Showing 5 of 10 publications

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