Prof. Han Haitjema
Professor at KU Leuven
SPIE Involvement:
Author | Instructor
Area of Expertise:
Metrology , Interferometry
Publications (14)

Proceedings Article | 18 August 2005 Paper
Proc. SPIE. 5879, Recent Developments in Traceable Dimensional Measurements III
KEYWORDS: Beam splitters, Lasers, Polarization, Interferometers, Receivers, Optical testing, Heterodyning, Transmittance, Aluminum, Signal detection

Proceedings Article | 18 August 2005 Paper
Proc. SPIE. 5879, Recent Developments in Traceable Dimensional Measurements III
KEYWORDS: Optical filters, Safety, Interferometers, Calibration, Denoising, Interferometry, Linear filtering, Gaussian filters, Radium, Ranging

SPIE Journal Paper | 1 February 2005
OE Vol. 44 Issue 02
KEYWORDS: Polarization, Connectors, Interferometers, Fiber characterization, Polarizers, Heterodyning, Wave plates, Optical engineering, Data modeling, Phase modulation

SPIE Journal Paper | 1 February 2005
OE Vol. 44 Issue 02
KEYWORDS: Polarization, Polarizers, Interferometers, Phase modulation, Heterodyning, Fiber characterization, Connectors, Fiber lasers, Optical fibers, Lasers

Proceedings Article | 26 February 2004 Paper
Proc. SPIE. 5252, Optical Fabrication, Testing, and Metrology
KEYWORDS: Mirrors, Metrology, Interferometers, Calibration, Distortion, Distance measurement, Optical alignment, Phase measurement, Semiconducting wafers, Phase shifts

Showing 5 of 14 publications
Conference Committee Involvement (2)
Recent Developments in Traceable Dimensional Measurements III
31 July 2005 | San Diego, California, United States
Recent Developments in Traceable Dimensional Measurements II
4 August 2003 | San Diego, California, United States
Course Instructor
SC562: Accuracy of Interferometric Measurements for Nano-Metrology
This course gives the attendees insight into the physical principles that enable and limit the possibilities of metrology at the nm-uncertainty level. An overview will be given of measurement techniques and principles that are available, with emphasis on their suitability for accurate measurements. Special attention will be given to laser-interferometry. This technique for measuring displacements can be used in several ways as part of a nanometer measuring- or manufacturing device. Another important measuring technique is the measurement of flatness and form deviations by Fizeau or similar interferometers. It will be demonstrated where the limits are and how these can be established for this technique. Examples will be given in the measurement of nanostructures.
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