Dr. Hans Willy Becker
at SCHOTT Lithotec AG
SPIE Involvement:
Author
Publications (22)

Proceedings Article | 20 October 2006 Paper
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Lithography, Phase shifting, Optical lithography, Silica, Etching, Scanners, Photomasks, Tantalum, Semiconducting wafers, Phase shifts

Proceedings Article | 19 May 2006 Paper
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Lithography, Optical lithography, Etching, Transmittance, Photomasks, Nanoimprint lithography, Tantalum, Semiconducting wafers, Tolerancing, Phase shifts

Proceedings Article | 19 May 2006 Paper
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Lithography, Lithographic illumination, Polarization, Scanners, Manufacturing, Polarizers, Photomasks, Line width roughness, Tantalum, Phase shifts

Proceedings Article | 4 November 2005 Paper
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Antireflective coatings, Reflection, Opacity, Etching, Interfaces, Inspection, Photomasks, Binary data, Phase shifts

Proceedings Article | 5 October 2005 Paper
Proc. SPIE. 5963, Advances in Optical Thin Films II
KEYWORDS: Oxides, Lithography, Phase shifting, Reflection, Etching, Dry etching, Inspection, Photomasks, Tantalum, Phase shifts

Showing 5 of 22 publications
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