Dr. Hao-Tien Daniel Lee Profile

Dr. Hao-Tien Daniel Lee

Vice President

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Author

Publications (9)

Proceedings Article | 19 April 2013 Paper

Self-powered wireless vibration-sensing system for machining monitoring

Tien-Kan Chung, Hao Lee, Chia-Yung Tseng, Wen-Tuan Lo, Chieh-Min Wang, Wen-Chin Wang, Chi-Jen Tu, Pei-Yuan Tasi, Jui-Wen Chang

Proceedings Volume 8692, 86922U (2013) https://doi.org/10.1117/12.2009435

KEYWORDS: Sensing systems, Signal processing, Spindles, Electromagnetism, Microelectromechanical systems, Sensors, Computing systems, Inductance, Ions, Solar energy

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Proceedings Article | 7 June 1996 Paper

Fabrication of single/double crown-shaped capacitors on DRAM cell using phase-shift mask technology

John Lin, Daniel Lee

Proceedings Volume 2726, (1996) https://doi.org/10.1117/12.240951

KEYWORDS: Phase shifts, Capacitors, Photomasks, Photoresist materials, Etching, Double patterning technology, Lithography, Electrodes, Silicon, Oxides

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Proceedings Article | 9 June 1995 Paper

Studies on the adhesion contact angle of various substrates and their photoresist profiles

Chang-Ming Dai, Daniel Lee

Proceedings Volume 2438, (1995) https://doi.org/10.1117/12.210406

KEYWORDS: Photoresist materials, Head-mounted displays, Silicon, Tungsten, Diffractive optical elements, Photoresist developing, Scanning electron microscopy, Photography, Manufacturing, Semiconducting wafers

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Proceedings Article | 26 May 1995 Paper

Investigation of lithography yield-loss issues from focusing/leveling system of advance stepper

Daniel Lee, Chia-Jen Cheng, Tah-Te Shih

Proceedings Volume 2440, (1995) https://doi.org/10.1117/12.209311

KEYWORDS: Aluminum, Semiconducting wafers, Lithography, Inspection, Control systems, Image processing, Metals, Sensors, Scanning electron microscopy, Optical microscopes

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Proceedings Article | 17 May 1994 Paper

Metal layer resist process optimization by design of experiment

Gwo-Yuh Shiau, Daniel Lee, Hwang-Kuen Lin

Proceedings Volume 2197, (1994) https://doi.org/10.1117/12.175493

KEYWORDS: Photoresist processing, Metals, Semiconducting wafers, Thin films, Silicon, Critical dimension metrology, Scanning electron microscopy, Signal to noise ratio, Diffractive optical elements, Tin

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Proceedings Article | 1 May 1994 Paper

AFM application on the topography study of stack cell DRAM processes

Daniel Lee, Gwo-Yuh Shiau

Proceedings Volume 2196, (1994) https://doi.org/10.1117/12.174163

KEYWORDS: Atomic force microscopy, Lithography, Data processing, Semiconducting wafers, Optical lithography, Metals, Atomic force microscope, Scanning electron microscopy, Analytical research, Thin films

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Proceedings Article | 8 August 1993 Paper

I-line lithography for subhalf-micron design rules

Barton Katz, Leif Sloan, James Foster, Richard Rogoff, Ronfu Chu, Daniel Lee

Proceedings Volume 1927, (1993) https://doi.org/10.1117/12.150434

KEYWORDS: Photoresist materials, Photoresist processing, Optical lithography, Oxides, Metals, Lithography, Lens design, Photomicroscopy, Product engineering, Semiconducting wafers

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Proceedings Article | 8 August 1993 Paper

Photoresist striation study on the 8-inch topography wafer

Daniel Lee, Chih-Yung Lin, Gwo-Yuh Shiau

Proceedings Volume 1927, (1993) https://doi.org/10.1117/12.150472

KEYWORDS: Semiconducting wafers, Photoresist materials, Diffractive optical elements, Signal to noise ratio, Coating, Wafer-level optics, Analytical research, Factor analysis, Photoresist processing, Optical lithography

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Proceedings Article | 1 June 1992 Paper

Process solutions for the global proximity effect on submicron lithography

Daniel Lee, Ronfu Chu

Proceedings Volume 1674, (1992) https://doi.org/10.1117/12.130318

KEYWORDS: Photoresist materials, Critical dimension metrology, Submicron lithography, Printing, Photoresist processing, Thin films, Optical lithography, Coating, Thin film coatings, Process control

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Showing 5 of 9 publications

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