Dr. Harry J. Levinson
Principal Lithographer at HJL Lithography
SPIE Involvement:
Board of Editors | Editor-in-Chief: Journal of Micro/Nanolithography, MEMS, and MOEMS | Author | Instructor | Visiting Lecturer
Area of Expertise:
Publications (96)

SPIE Journal Paper | 20 October 2020
JM3 Vol. 19 Issue 04

SPIE Journal Paper | 4 August 2020
JM3 Vol. 19 Issue 03
KEYWORDS: Lithography, Silicon films, Silicon, Polymers, Photoresist processing, Microopto electromechanical systems, Microelectromechanical systems, Metrology, Data processing

SPIE Journal Paper | 19 May 2020
JM3 Vol. 19 Issue 02
KEYWORDS: Metrology, Lithography, Microopto electromechanical systems, Electronic components, Optical microsystems, Optical lithography, Process control, Etching, Microsystems, Optical engineering

Proceedings Article | 28 April 2020 Presentation
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI

Proceedings Article | 23 March 2020 Presentation + Paper
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Lithography, Logic, Extreme ultraviolet, Line width roughness, Absorbance, Extreme ultraviolet lithography, Nanoimprint lithography, Line edge roughness, Stochastic processes

Showing 5 of 96 publications
Proceedings Volume Editor (4)

SPIE Conference Volume | 13 March 2009

SPIE Conference Volume | 20 March 2008

SPIE Conference Volume | 9 March 2007

SPIE Conference Volume | 2 April 2006

Conference Committee Involvement (15)
SPIE Advanced Lithography
21 February 2016 | San Jose, United States
SPIE Advanced Lithography
23 February 2014 | San Jose, United States
SPIE Advanced Lithography
24 February 2013 | San Jose, United States
SPIE Advanced Lithography
12 February 2012 | San Jose, United States
SPIE Advanced Lithography
27 February 2011 | San Jose, United States
Showing 5 of 15 Conference Committees
Course Instructor
SC111: Lithography Process Control
The class connects lithographic science to process control, and appropriate statistical methods useful for lithographers are introduced. Specific topics include: <br/> - Statistical process control, focusing on aspects particular to lithography <br/> - Efficient measurement sampling plans for achieving desired accuracy <br/> - Cause-and-effect diagrams in the context of lithography <br/> - Control issues specific to critical dimensions <br/> - Control issues specific to overlay <br/> - Control issues specific to EUV lithography <br/> - Edge placement errors <br/> - Yield issues specific to lithography <br/> - Metrology for lithographic applications <br/> - Automatic process control <br/> - Control of operations
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