Dr. Haruhiko Kusunose Profile

Dr. Haruhiko Kusunose

Managing Director at Lasertec Corp

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Author

Publications (25)

Proceedings Article | 9 April 2020 Paper

Enabling EUVL high-volume manufacturing with actinic patterned mask inspection

Anna Tchikoulaeva, Hiroki Miyai, Tsunehito Kohyama, Kiwamu Takehisa, Haruhiko Kusunose

Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI

KEYWORDS: Inspection, Photomasks, Extreme ultraviolet lithography, Extreme ultraviolet, Reticles, Defect detection, High volume manufacturing, Particles, Pellicles, Deep ultraviolet

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Proceedings Article | 25 November 2019

Actinic patterned mask defect inspection for EUV lithography

Hiroki Miyai, Tsunehito Kohyama, Tomohiro Suzuki, Kiwamu Takehisa, Haruhiko Kusunose

Proc. SPIE. 11148, Photomask Technology 2019

KEYWORDS: Photomasks, Inspection, Extreme ultraviolet, Defect inspection, Deep ultraviolet, Defect detection, Semiconducting wafers, Extreme ultraviolet lithography, Lithography, Image resolution

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Proceedings Article | 13 July 2017 Paper

Development of high sensitivity and high speed large size blank inspection system LBIS

Shinobu Ohara, Akinori Yoshida, Mitsuo Hirai, Takenori Kato, Koichi Moriizumi, Haruhiko Kusunose

Proc. SPIE. 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology

KEYWORDS: Inspection, Photomasks, Light scattering, Organic light emitting diodes, Digital image correlation, Manufacturing, Laser development, Optics manufacturing, LCDs, Particles

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Proceedings Article | 18 March 2016 Paper

Advances in the detection capability on actinic blank inspection

Takeshi Yamane, Tsuyoshi Amano, Noriaki Takagi, Hidehiro Watanabe, Ichro Mori, Tomohisa Ino, Tomohiro Suzuki, Kiwamu Takehisa, Hiroki Miyai, Haruhiko Kusunose

Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII

KEYWORDS: Inspection, Photomasks, Extreme ultraviolet lithography, Light scattering, Multilayers, Defect detection, Extreme ultraviolet, Semiconducting wafers, Lithographic illumination, Mirrors, EUV optics, CCD cameras

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Proceedings Article | 9 July 2015 Paper

Detection capability of Actinic Blank Inspection tool

Tomohiro Suzuki, Hiroki Miyai, Kiwamu Takehisa, Haruhiko Kusunose, Hidehiro Watanabe, Ichiro Mori

Proc. SPIE. 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII

KEYWORDS: Inspection, Mirrors, Lithographic illumination, Extreme ultraviolet, Defect detection, Photomasks, Ray tracing, Data modeling, Extreme ultraviolet lithography, High volume manufacturing

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Proceedings Article | 28 July 2014 Paper

Defect analysis on actinic blank inspection tool

Tomohiro Suzuki, Hiroki Miyai, Kiwamu Takehisa, Haruhiko Kusunose, Takeshi Yamane, Hidehiro Watanabe, Ichiro Mori

Proc. SPIE. 9256, Photomask and Next-Generation Lithography Mask Technology XXI

KEYWORDS: Inspection, Extreme ultraviolet lithography, Photomasks, Extreme ultraviolet, Image classification, Mirrors, Geometrical optics, Ray tracing, Lithography, Manufacturing

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Proceedings Article | 28 July 2014 Paper

Performance in practical use of actinic EUVL mask blank inspection

Takeshi Yamane, Yongdae Kim, Noriaki Takagi, Tsuneo Terasawa, Tomohisa Ino, Tomohiro Suzuki, Hiroki Miyai, Kiwamu Takehisa, Haruhiko Kusunose

Proc. SPIE. 9256, Photomask and Next-Generation Lithography Mask Technology XXI

KEYWORDS: Photomasks, Inspection, Surface roughness, Prototyping, Semiconducting wafers, Defect detection, Critical dimension metrology, Extreme ultraviolet lithography, Light scattering, CCD cameras

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Proceedings Article | 28 June 2013 Paper

The capability of high magnification review function for EUV actinic blank inspection tool

Hiroki Miyai, Tomohiro Suzuki, Kiwamu Takehisa, Haruhiko Kusunose, Takeshi Yamane, Tsuneo Terasawa, Hidehiro Watanabe, Ichiro Mori

Proc. SPIE. 8701, Photomask and Next-Generation Lithography Mask Technology XX

KEYWORDS: Inspection, Mirrors, Extreme ultraviolet, Extreme ultraviolet lithography, Photomasks, Charge-coupled devices, Defect detection, Multilayers, Switches, Ions

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Proceedings Article | 1 April 2013 Paper

EUV actinic blank inspection: from prototype to production

Anna Tchikoulaeva, Hiroki Miyai, Tomohiro Suzuki, Kiwamu Takehisa, Haruhiko Kusunose, Takeshi Yamane, Tsuneo Terasawa, Hidehiro Watanabe, Soichi Inoue, Ichiro Mori

Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV

KEYWORDS: Inspection, Extreme ultraviolet, Photomasks, Defect inspection, Prototyping, Extreme ultraviolet lithography, Defect detection, High volume manufacturing, Metrology, Mirrors

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Proceedings Article | 30 June 2012 Paper

EUV actinic blank inspection tool with a high magnification review mode

Tomohiro Suzuki, Hiroki Miyai, Kiwamu Takehisa, Haruhiko Kusunose, Takeshi Yamane, Tsuneo Terasawa, Hidehiro Watanabe, Soichi Inoue, Ichiro Mori

Proc. SPIE. 8441, Photomask and Next-Generation Lithography Mask Technology XIX

KEYWORDS: Inspection, Mirrors, Extreme ultraviolet, Switches, EUV optics, Photomasks, Charge-coupled devices, Cameras, Extreme ultraviolet lithography, Electroluminescent displays

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Proceedings Article | 11 May 2009 Paper

Improvement of EUVL mask blank inspection capability at Intel

Andy Ma, Ted Liang, Seh-Jin Park, Guojing Zhang, Tomoya Tamura, Kazunori Omata, Yuta Sato, Hal Kusunose

Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI

KEYWORDS: Inspection, Quartz, Silica, Photomasks, Particles, Extreme ultraviolet lithography, Extreme ultraviolet, Defect detection, Surface roughness, Defect inspection

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Proceedings Article | 11 May 2009 Paper

Phase-shift/transmittance measurements in a micro pattern using MPM193EX

Hiroto Nozawa, Takayuki Ishida, Satoru Kato, Osamu Sato, Koji Miyazaki, Kiwamu Takehisa, Naoki Awamura, Hideo Takizawa, Hal Kusunose

Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI

KEYWORDS: Phase measurement, Transmittance, Photomasks, Signal detection, Lithography, Distance measurement, Interferometers, Image processing, Charge-coupled devices, Objectives

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Proceedings Article | 30 October 2007 Paper

EUV mask substrate flatness improvement by laser irradiation

Kiwamu Takehisa, Jun Kodama, Haruhiko Kusunose

Proc. SPIE. 6730, Photomask Technology 2007

KEYWORDS: Laser irradiation, Excimer lasers, Extreme ultraviolet, Quartz, Pulsed laser operation, Optical simulations, Extreme ultraviolet lithography, EUV optics, Polishing, Surface finishing

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Proceedings Article | 13 March 2007 Paper

Inspection with the Lasertec M7360 at the SEMATECH Mask Blank Development Center

Wonil Cho, Patrick Kearney, Eric Gullikson, Anwei Jia, Tomoya Tamura, Atsushi Tajima, Hal Kusunose, Chan-Uk Jeon

Proc. SPIE. 6517, Emerging Lithographic Technologies XI

KEYWORDS: Inspection, Photomasks, Extreme ultraviolet lithography, Defect detection, Extreme ultraviolet, Reflectivity, Multilayers, Defect inspection, Atomic force microscopy, Optical spheres

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Proceedings Article | 6 May 2005 Paper

Modeling the defect inspection sensitivity of a confocal microscope

E. Gullikson, E. Tejnil, K.-Y. Tsai, A. Stivers, H. Kusunose

Proc. SPIE. 5751, Emerging Lithographic Technologies IX

KEYWORDS: Optical spheres, Multilayers, Confocal microscopy, Photomasks, Microscopes, Silica, Defect inspection, Light scattering, Inspection, Scattering

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Proceedings Article | 17 December 2003 Paper

EUV substrate and blank inspection with confocal microscopy

Jan-Peter Urbach, Jan Cavelaars, Hal Kusunose, Ted Liang, Alan Stivers

Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology

KEYWORDS: Inspection, Photomasks, Semiconducting wafers, Extreme ultraviolet lithography, Quartz, Confocal microscopy, Scattering, Particles, Signal detection, Extreme ultraviolet

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Proceedings Article | 17 December 2003 Paper

Development of phase-shift and transmittance metrology system for 157-nm PSMs

Hal Kusunose, Takashi Yasui, Iwao Higashikawa

Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology

KEYWORDS: Transmittance, Phase measurement, Photomasks, Interferometers, Quartz, Lithography, Ultraviolet radiation, Deep ultraviolet, Charge-coupled devices, Metrology

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Proceedings Article | 24 July 1996 Paper

Direct phase-shift measurement with transmitted deep-UV illumination

Haruhiko Kusunose, Naoki Awamura, Hideo Takizawa, Kouji Miyazaki, Takahiro Ode, Daikichi Awamura

Proc. SPIE. 2793, Photomask and X-Ray Mask Technology III

KEYWORDS: Phase measurement, Interferometers, Deep ultraviolet, Quartz, Refractive index, Photomasks, Semiconducting wafers, Excimer lasers, Lamps, Etching

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Proceedings Article | 24 July 1996 Paper

Performance of i- and g-line phase-shift measurement system MPM-100

Hiroshi Fujita, Hisatake Sano, Haruhiko Kusunose, Hideo Takizawa, Kouji Miyazaki, Naoki Awamura, Takahiro Ode, Daikichi Awamura

Proc. SPIE. 2793, Photomask and X-Ray Mask Technology III

KEYWORDS: Phase shifts, Phase measurement, Halftones, Sodium, Transmittance, Refractive index, Photomasks, Objectives, Quartz, Laser systems engineering

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Proceedings Article | 24 July 1996 Paper

Transmittance measurement with interferometer system

Hideo Takizawa, Haruhiko Kusunose, Naoki Awamura, Kouji Miyazaki, Takahiro Ode, Daikichi Awamura

Proc. SPIE. 2793, Photomask and X-Ray Mask Technology III

KEYWORDS: Transmittance, Interferometers, Shearing interferometers, Microscopes, Virtual point source, Spectrophotometry, Optical testing, Photomasks, Mirrors, Particles

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Proceedings Article | 3 November 1994 Paper

Phase measurement system with transmitted UV light for phase-shifting mask inspection

Haruhiko Kusunose, Hiroyuki Nakae, Junji Miyazaki, Nobuyuki Yoshioka, Hiroaki Morimoto, Keiichi Murayama, Katsuhiro Tsukamoto

Proc. SPIE. 2254, Photomask and X-Ray Mask Technology

KEYWORDS: Phase shifts, Phase measurement, Photomasks, Semiconducting wafers, Quartz, Inspection, Shearing interferometers, Transmittance, Microscopes, Refractive index

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Proceedings Article | 17 May 1994 Paper

Attenuated phase-shifting mask with a single-layer absorptive shifter of CrO, CrON, MoSiO, and MoSiON film

Masayuki Nakajima, Nobuyuki Yoshioka, Junji Miyazaki, Haruhiko Kusunose, Kunihiro Hosono, Hiroaki Morimoto, Wataru Wakamiya, Keiichi Murayama, Yaichiro Watakabe, Katsuhiro Tsukamoto

Proc. SPIE. 2197, Optical/Laser Microlithography VII

KEYWORDS: Photomasks, Phase shifts, Lithography, Etching, Transmittance, Excimer lasers, Semiconducting wafers, Sputter deposition, Mask making, Molybdenum

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Proceedings Article | 8 August 1993 Paper

Advanced process with magnetically enhanced RIE for phase-shifting mask fabrication

Satoshi Aoyama, Haruhiko Kusunose, Minoru Hanazaki, Nobuyuki Yoshioka, Yaichiro Watakabe, Atsushi Hayashi, Akihiko Isao, Yasuo Tokoro

Proc. SPIE. 1927, Optical/Laser Microlithography

KEYWORDS: Etching, Magnetism, Chromium, Phase shifts, Protactinium, Photomasks, Optical lithography, Reactive ion etching, Critical dimension metrology, Plasma

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Proceedings Article | 1 June 1992 Paper

Novel process for phase-shifting mask fabrication

Haruhiko Kusunose, Satoshi Aoyama, Kunihiro Hosono, Susumu Takeuchi, Shuichi Matsuda, Maaike Op de Beeck, Nobuyuki Yoshioka, Yaichiro Watakabe

Proc. SPIE. 1674, Optical/Laser Microlithography V

KEYWORDS: Phase shifts, Chromium, Photomasks, Etching, Mask making, Ultraviolet radiation, Metals, Quartz, Inspection, Floods

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Proceedings Article | 1 June 1992 Paper

Shape effects of edge-line phase shifter on light intensity contrast

Mitsunori Nakatani, Hirofumi Nakano, Haruhiko Kusunose, Kazuya Kamon, Shuichi Matsuda, Yaichiro Watakabe, Hirozo Takano, Mutuyuki Otsubo

Proc. SPIE. 1674, Optical/Laser Microlithography V

KEYWORDS: Phase shifts, Image processing, Photoresist processing, Optical lithography, Image resolution, Gallium arsenide, Field effect transistors, Phase shifting, Semiconducting wafers, Optoelectronics

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Showing 5 of 25 publications

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