Dr. Haruhiko Kusunose
Managing Director at Lasertec Corp
SPIE Involvement:
Author
Publications (25)

Proceedings Article | 9 April 2020 Paper
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Inspection, Photomasks, Extreme ultraviolet lithography, Extreme ultraviolet, Reticles, Defect detection, High volume manufacturing, Particles, Pellicles, Deep ultraviolet

Proceedings Article | 25 November 2019 Paper
Proc. SPIE. 11148, Photomask Technology 2019
KEYWORDS: Photomasks, Inspection, Extreme ultraviolet, Defect inspection, Deep ultraviolet, Defect detection, Semiconducting wafers, Extreme ultraviolet lithography, Lithography, Image resolution

Proceedings Article | 13 July 2017 Paper
Proc. SPIE. 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Inspection, Photomasks, Light scattering, Organic light emitting diodes, Digital image correlation, Manufacturing, Laser development, Optics manufacturing, LCDs, Particles

Proceedings Article | 18 March 2016 Paper
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Inspection, Photomasks, Extreme ultraviolet lithography, Light scattering, Multilayers, Defect detection, Extreme ultraviolet, Semiconducting wafers, Lithographic illumination, Mirrors, EUV optics, CCD cameras

Proceedings Article | 9 July 2015 Paper
Proc. SPIE. 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
KEYWORDS: Inspection, Mirrors, Lithographic illumination, Extreme ultraviolet, Defect detection, Photomasks, Ray tracing, Data modeling, Extreme ultraviolet lithography, High volume manufacturing

Showing 5 of 25 publications
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