KEYWORDS: Air contamination, Photomasks, Raman spectroscopy, Molybdenum, Particles, Chemical analysis, Quartz, Ions, Testing and analysis, Scanning electron microscopy
ArF lithography sometimes generates the haze defects on the photomask substrate, resulting in serious yield deterioration
in ULSI production. In order to solve this problem, experimental and theoretical studies have been carried out on the
generated haze defects. In characterizing the haze defects, the composition and chemical structure of the haze defects
were analyzed by focusing on 1.0 x 0.3μm sizes defects using Raman, ToF-SIMS and AES spectroscopy with their
highest spatial and mass resolution level. To confirm the experimental analyses, theoretical ab initio molecular orbital
calculations were carried out on the model compounds of the generated haze defects. These experimental and theoretical
studies indicate that the haze defects on quartz surface consist of (NH4)2SO4 and that those on half-tone (HT) film
surface, on the other hand, consist of (MoO3)x(SO4)y(NH4)z complex including Mo from HT film material. In the latter
case, NH4 ion was observed only in surface region of the haze defects. Based on these results, we have proposed a novel
model of haze generation mechanism on quartz and HT film surfaces of photomask substrate.
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