Mr. Haruyuki Nomura Profile

Haruyuki Nomura

at NuFlare Technology Inc

SPIE Involvement:

Author

Publications (13)

SPIE Journal Paper | 14 February 2024

Curvilinear mask process correction embedded on multi-beam mask writer

Noriaki Nakayamada, Haruyuki Nomura, Yasuo Kato, Kenichi Yasui, Abhishek Shendre, Nagesh Shirali, Yukihiro Masuda, Aki Fujimura

JM3, Vol. 23, Issue 01, 011206, (February 2024) https://doi.org/10.1117/12.10.1117/1.JMM.23.1.011206

KEYWORDS: Design, Etching, Vestigial sideband modulation, Printing, Dose control, Raster graphics, Bias correction, Lithography, Electron beam lithography, Scanning electron microscopy

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Proceedings Article | 1 May 2023 Presentation + Paper

Current performance and future plans on electron multi-beam mask writers toward high-NA EUV era

Hiroshi Matsumoto, Haruyuki Nomura, Hayato Kimura, Keisuke Yamaguchi, Yoshinori Kojima, Masato Saito, Takao Tamura, Noriaki Nakayamada

Proceedings Volume 12497, 1249708 (2023) https://doi.org/10.1117/12.2657994

KEYWORDS: Manufacturing, Extreme ultraviolet, Data conversion, Control systems, Microelectromechanical systems, Photomasks, Electron beam lithography

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Proceedings Article | 30 April 2023 Presentation

Curvilinear mask process correction with zero additional turnaround time

Noriaki Nakayamada, Haruyuki Nomura, Ryosuke Ueba, Yasuo Kato, Kenichi Yasui

Proceedings Volume 12495, 1249507 (2023) https://doi.org/10.1117/12.2658633

KEYWORDS: Photomasks, Vestigial sideband modulation, Raster graphics, Manufacturing, Electron beam lithography, Beam shaping

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Proceedings Article | 11 November 2022 Presentation

Selective leading-edge mask writing and high-throughput mask writing in multi-beam mask writer MBM-2000PLUS

Haruyuki Nomura, Hiroshi Matsumoto, Keisuke Yamaguchi, Hayato Kimura, Noriaki Nakayamada

Proceedings Volume PC12293, PC122930I (2022) https://doi.org/10.1117/12.2641449

KEYWORDS: Photomasks, Glasses, Semiconductors, Physical phenomena, Optical lithography, Mask making, Line edge roughness, Extreme ultraviolet lithography, Error analysis, Edge roughness

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Proceedings Article | 16 September 2022 Paper

Multi-beam mask writer MBM-2000PLUS

Haruyuki Nomura, Hiroshi Matsumoto, Keisuke Yamaguchi, Hayato Kimura, Satoshi Nakahashi, Noriaki Nakayamada

Proceedings Volume 12325, 123250O (2022) https://doi.org/10.1117/12.2641338

KEYWORDS: Photomasks, Line edge roughness, Mask making, Metrology, Data conversion, Convolution, Data processing

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Proceedings Article | 25 May 2022 Presentation + Paper

Multi-beam mask writer MBM-2000PLUS

Haruyuki Nomura, Hiroshi Matsumoto, Keisuke Yamaguchi, Hayato Kimura, Satoshi Nakahashi, Nariaki Nakayamada

Proceedings Volume 12054, 1205408 (2022) https://doi.org/10.1117/12.2616664

KEYWORDS: Photomasks, Line edge roughness, Mask making, Data conversion, Data processing

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SPIE Journal Paper | 9 November 2021

Study on physical model of resist surface charge in multi-beam mask writer and single variable-shaped beam writers

Haruyuki Nomura, Noriaki Nakayamada, Hayato Kimura, Keisuke Yamaguchi, Takanao Touya, Kazuhiro Kishi, Yasunori Hatanaka, Kenji Ohtoshi

JM3, Vol. 20, Issue 04, 041404, (November 2021) https://doi.org/10.1117/12.10.1117/1.JMM.20.4.041404

KEYWORDS: Electron beam melting, Photomasks, Electron beams, Diffusion, Differential equations, Metrology, Glasses, Polymethylmethacrylate, Optical simulations, Statistical analysis

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Proceedings Article | 12 October 2021 Presentation + Paper

Study on modeling of resist surface charge effect on mask blanks with charge dissipation layer in electron beam mask writers

Haruyuki Nomura, Noriaki Nakayamada, Takashi Kamikubo, Reiko Nishimura, Rumi Ito, Yoshinori Kojima

Proceedings Volume 11855, 118550X (2021) https://doi.org/10.1117/12.2600774

KEYWORDS: Electron beams, Photomasks, Diffusion, Electromagnetism, Metrology, Line edge roughness, Data modeling, Scattering, Lithography, Laser scattering

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Proceedings Article | 20 September 2020 Poster + Presentation + Paper

Study on physical model of resist surface charge in electron beam mask writer EBM-9500PLUS

Haruyuki Nomura, Noriaki Nakayamada, Takehiko Katsumata, Rumi Ito, Yoshinori Kojima

Proceedings Volume 11518, 115180Z (2020) https://doi.org/10.1117/12.2572199

KEYWORDS: Electron beams, Statistical modeling, Photomasks, Vestigial sideband modulation, Diffusion

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Proceedings Article | 13 July 2017 Paper

Electron beam lithographic modeling assisted by artificial intelligence technology

Noriaki Nakayamada, Rieko Nishimura, Satoru Miura, Haruyuki Nomura, Takashi Kamikubo

Proceedings Volume 10454, 104540B (2017) https://doi.org/10.1117/12.2282841

KEYWORDS: Neural networks, Yield improvement, Convolutional neural networks, Critical dimension metrology, Electron beam lithography, Electron beams, Lithography, Artificial intelligence, Machine learning

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Proceedings Article | 25 October 2016 Paper

Electron beam mask writer EBM-9500 for logic 7nm node generation

Hideki Matsui, Takashi Kamikubo, Satoshi Nakahashi, Haruyuki Nomura, Noriaki Nakayamada, Mizuna Suganuma, Yasuo Kato, Jun Yashima, Victor Katsap, Kenichi Saito, Ryoei Kobayashi, Nobuo Miyamoto, Munehiro Ogasawara

Proceedings Volume 9985, 998508 (2016) https://doi.org/10.1117/12.2242987

KEYWORDS: Photomasks, Lithography, Electron beams, Logic, Electron beam melting, Line edge roughness, Electron beam lithography, Extreme ultraviolet, Optical lithography, LCDs

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SPIE Journal Paper | 23 March 2016

Correction of resist heating effect on variable shaped beam mask writer

Noriaki Nakayamada, Mizuna Suganuma, Haruyuki Nomura, Yasuo Kato, Takashi Kamikubo, Munehiro Ogasawara, Harold Zable, Yukihiro Masuda, Aki Fujimura

JM3, Vol. 15, Issue 02, 021012, (March 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.2.021012

KEYWORDS: Critical dimension metrology, Beam shaping, Vestigial sideband modulation, Photomasks, Diffusion, Glasses, Line edge roughness, Error analysis, Thermal modeling, Temperature metrology

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Proceedings Article | 9 July 2015 Paper

Study on modeling of resist heating effect correction in EB mask writer EBM-9000

Haruyuki Nomura, Takashi Kamikubo, Mizuna Suganuma, Yasuo Kato, Jun Yashima, Noriaki Nakayamada, Hirohito Anze, Munehiro Ogasawara

Proceedings Volume 9658, 96580R (2015) https://doi.org/10.1117/12.2199615

KEYWORDS: Critical dimension metrology, Modulation, Temperature metrology, Computer simulations, Photomasks, Quartz, Thermal modeling, Diffusion, Roentgenium, Electron beam lithography

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Showing 5 of 13 publications

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