Haruyuki Nomura
at NuFlare Technology Inc
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 20 September 2020 Poster + Presentation + Paper
Proc. SPIE. 11518, Photomask Technology 2020
KEYWORDS: Electron beams, Diffusion, Photomasks, Statistical modeling, Vestigial sideband modulation

Proceedings Article | 13 July 2017 Paper
Proc. SPIE. 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Lithography, Electron beam lithography, Electron beams, Convolutional neural networks, Neural networks, Machine learning, Artificial intelligence, Critical dimension metrology, Yield improvement

Proceedings Article | 25 October 2016 Paper
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Lithography, Electron beam lithography, Electron beams, Logic, Optical lithography, LCDs, Photomasks, Extreme ultraviolet, Electron beam melting, Line edge roughness

SPIE Journal Paper | 23 March 2016
JM3 Vol. 15 Issue 02
KEYWORDS: Critical dimension metrology, Beam shaping, Vestigial sideband modulation, Photomasks, Diffusion, Glasses, Line edge roughness, Error analysis, Thermal modeling, Temperature metrology

Proceedings Article | 9 July 2015 Paper
Proc. SPIE. 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
KEYWORDS: Electron beam lithography, Roentgenium, Modulation, Quartz, Diffusion, Computer simulations, Photomasks, Critical dimension metrology, Thermal modeling, Temperature metrology

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