Prof. Hee-Youl Lim
at SK Hynix Inc
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 1 April 2013 Paper
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Optical lithography, Optical proximity correction, Manufacturing, Scanners, Photomasks, Critical dimension metrology, Overlay metrology, Line width roughness

Proceedings Article | 2 April 2010 Paper
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Semiconducting wafers, Overlay metrology, Chemical mechanical planarization, Process control, Distortion, Photomasks, Optical alignment, Optical lithography, Data modeling, Control systems

Proceedings Article | 4 March 2010 Paper
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Photomasks, Binary data, Transmittance, Diffraction, Chromium, Polarization, Lithography, Scanners, Nanoimprint lithography, Optical lithography

Proceedings Article | 4 December 2008 Paper
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Double patterning technology, Lithography, Photomasks, Etching, Photoresist materials, Optical lithography, Image processing, Coating, Scanning electron microscopy, Extreme ultraviolet

Proceedings Article | 2 April 2007 Paper
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Bridges, Semiconducting wafers, Immersion lithography, Molecular bridges, Particles, Thin film coatings, Photoresist processing, Coating, Lithography, Metrology

Showing 5 of 6 publications
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